The Burning Rate of Energetic Films of Nanostructured Porous Silicon

Plummer, Andrew; Кузнецов, В. А.; Joyner, Timothy; Shapter, Joseph G.; Voelcker, Nicolas H.

doi:10.1002/smll.201101087

Cited by 54 publications

(45 citation statements)

References 15 publications

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“…Critical to the ultimate reactivity of the energetic films is the resulting size [34] and morphology [35][36][37] of the constituents that make up the film, often which are significantly affected by the intermixing and deposition processes. Such environments vary broadly as well, ranging from a gentle mixing, stirring, or coalescence processes [38], to more intense milling [39], swaging, [40] or sonication processes [12,41].…”

Section: Introductionmentioning

confidence: 99%

Physiochemical Characterization of Iodine (V) Oxide Part II: Morphology and Crystal Structure of Particulate Films

2015

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Abstract:In this study, the production of particulate films of iodine (V) oxides is investigated. The influence that sonication and solvation of suspended particles in various alcohol/ketone/ester solvents have on the physical structure of spin or drop cast films is examined in detail with electron microscopy, powder x-ray diffraction, and UV-visible absorption spectroscopy. Results indicate that sonicating iodine oxides in alcohol mixtures containing trace amounts of water decreases deposited particle sizes and produces a more uniform film morphology. UV-visible spectra of the pre-cast suspensions reveal that for some solvents, the iodine oxide oxidizes the solvent, producing I2 and lowering the pH of the suspension. Characterizing the crystals within the cast films reveal their composition to be primarily HI3O8, their orientations to exhibit a preferential orientation, and their growth to be primarily along the ac-plane of the crystal, enhanced at higher spin rates. Spin-coating at lower spin rates produces laminate-like particulate films versus higher density, one-piece films of stacked particles produced by drop casting. The particle morphology in these films consists of a combination of rods, plates, cubes, and rhombohedra structure.

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Section: Introductionmentioning

confidence: 99%

Physiochemical Characterization of Iodine (V) Oxide Part II: Morphology and Crystal Structure of Particulate Films

2015

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“…Several of its material characteristics, including high surface area, energy density, and MEMS compatibility make PS a particularly interesting candidate for the field of energetic materials. Many forms of silicon have been used in energetic applications including silicon particles [8], nanowires and nanotubes [8], and on-chip etched porous silicon [1][2][3][4][9][10][11][12]. The most reactive of these is on-chip PS, which for over twenty years has been known to demonstrate explosive-like reactions [13].…”

Section: Introductionmentioning

confidence: 99%

Combustion and material characterization of porous silicon nanoenergetics

Piekiel

Churaman

Morris

et al. 2013

2013 IEEE 26th International Conference on Micro Electro Mechanical Systems (MEMS)

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Certain porous silicon (PS) structures have demonstrated energetic characteristics when mixed with an appropriate oxidizer [1][2][3][4]. However, limited studies on the effect of PS structure on its combustion have been performed. This work investigates how various material properties of PS films; surface area, porosity and pore size, affect the combustion process. With pore sizes in the range of 2.6-5.2 nm and surface area reaching over 900 m 2 /g, these materials are capable of considerably fast reactions. Combustion characterization is performed through high speed imaging at a rate of 930,000 frames per second. Propagation speeds in the current study range from 300 -1950 m/s, and some relationships between the pore characteristics and the propagation velocity are observed.A portion of the silicon is covered by a layered Si 3 N 4 /chrome/platinum/gold section that functions as an

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“…The reactive wave propagation speeds reported previously range from the order of 1 m/s (Parimi et al, 2012(Parimi et al, , 2014a to several hundreds of m/s Parimi et al, 2012Parimi et al, , 2014aPlummer et al, 2011) to several thousands of m/s Churaman et al, 2010;Piekiel et al, 2014). Reactive wave propagation speeds of 3660 m/s reported by Piekiel et al (2014) are among the highest speeds reported for nEMs.…”

Section: Introductionmentioning

confidence: 64%

“…This process is believed to be the mechanism responsible for the permeation of the gases ahead of the luminous reaction zone. Plummer et al (2011) attributed the erratic and infrequent "flame jump" observed in Figures 3c and 3d to the detachment of the PS film from the silicon substrate due to the pressure build up within the porous layer. Such skipping has been observed at speeds ranging from < 10 m/s in our work to speeds above 3000 m/s in Piekiel et al's (2014) work.…”

Section: Effect Of Microscale Structures On Reactive Wave Propagationmentioning

confidence: 90%

Reactive Wave Propagation Mechanisms in Energetic Porous Silicon Composites

Parimi

Tadigadapa

Yetter

2014

Combustion Science and Technology

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Propagating reactive waves through porous silicon (PS)-sodium perchlorate composites and the generation of shock waves in the gaseous medium above the PS surface were studied using high-speed shadowgraphy. Propagation speeds were varied by changing the PS specific surface area (SSA) and the dopant type and level, and by the addition of organized microstructures along the wave propagation direction. Shadowgraph analysis showed that upstream permeation of hot gaseous combustion products was responsible for a two order of magnitude enhancement in the reactive wave propagation speeds obtained by the presence of organized microscale patterns on PS samples with low SSA (∼ 300 m 2 /g), which nominally exhibit baseline speeds of ∼ 1 m/s. Shadowgraph analysis and sound speed measurements on PS samples with high SSA (∼ 700 m 2 /g), which exhibit fast reactive wave propagations of ∼ 1000 m/s, indicated that neither the strong shock over the PS surface nor detonation of the porous layer were the mechanisms by which the wave propagated. Thermal analysis of PS showed that the heat release from exothermic reactions between PS and the oxidizer within the pores shifted to lower temperatures as the SSA of PS increased, which was accompanied by a reduction in the activation energy associated with the lowest temperature exothermic reaction between PS and the oxidizer. The combined experiments indicated that a combination of conductive and convective burning, possibly assisted by fast crack propagation within the silicon/porous silicon substrate, was responsible for the observed difference in propagation speeds and was the mechanism by which the reactive wave propagated with speeds on the order of a km/s within the porous layers.

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The Burning Rate of Energetic Films of Nanostructured Porous Silicon

Cited by 54 publications

References 15 publications

Physiochemical Characterization of Iodine (V) Oxide Part II: Morphology and Crystal Structure of Particulate Films

Physiochemical Characterization of Iodine (V) Oxide Part II: Morphology and Crystal Structure of Particulate Films

Combustion and material characterization of porous silicon nanoenergetics

Reactive Wave Propagation Mechanisms in Energetic Porous Silicon Composites

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