The CFD modeling of the EB-PVD of SiC/Ti-6Al-4V coatings

Abstract

This article describes a comprehensive modeling approach to simulate the electron beam physical vapor deposition (EB-PVD) SiC/Ti-6Al-4V coating process. The approach is based on the numerical solution of evaporation, fl uid fl ow, species transfer, heat transfer, and a deposition/condensation model. Developed for this analysis were an ingot EB-melting/evaporation model, a computational fl uid dynamics threedimensional (3-D) chamber model, and a coating model. Simulation results for temperature and Ti-6-4 vapor concentration profi les are discussed, and the experimental microstructure and composition of the SiC/Ti-6-4 fiber are presented. INTRODUCTIONTo develop a model that simulates an electron beam physical vapor deposition (EB-PVD) process suitable for the manufacture of aerospace components containing titanium metal-matrix composite preforms, a study was undertaken with two objectives: First, optimize the chamber design and the EB-PVD process to enhance vaporization and deposition rates and patterns effi ciently and increase the SiC/Ti-6Al-4V (Ti-6-4) capture effi ciency onto SiC fi bers, and second, maintain or enhance the quality of the Ti-6-4 coating.The capture effi ciency is defi ned as the ratio of material deposited on the substrate to the material evaporated from the ingot. It is anticipated that through process optimization such as uniformity of temperature and metal vapor concentration in the rod-feed chamber, the capture effi ciency could increase by 50-100%. The key parameters of this process are surface area of the molten pool, EB effi ciency, and chamber cooling conditions; geometry of the plume and

A Parametric Three-Dimensional Phase-Field Study of the Physical Vapor Deposition Process of Metal Thin Films Aiming at Quantitative Simulations

“…Moreover, the calculated R q to R a ratios for the thin films at the deposition rates of 0.22 and 1.0 nm s −1 agreed very well with the experimental data of the deposited Mo and Ti thin films. Finally, further discussion about the correlative behaviors between the surface roughness and the density was proposed for reasoning the shadowing effect as well as the formation of voids during the thin film production.Coatings 2019, 9, 607 2 of 15 properties [14][15][16][17]. However, in fact, PVD is a considerably sophisticated process and it is extremely difficult to improve the performance of the coating just through variation of the process parameters.…”

“…Coatings 2019, 9, 607 2 of 15 properties [14][15][16][17]. However, in fact, PVD is a considerably sophisticated process and it is extremely difficult to improve the performance of the coating just through variation of the process parameters.…”