The chemistry and application of nonchemically amplified (non-CA) chain-scission resists

Synthesis of micro-crosslinked adamantane-containing matrix resins designed for deep-UV lithography resists and their application in nanoimprint lithography

“…33 However, a higher molecular weight and higher polydispersity index will lead to low sensitivity in the resist. 15 Sensitivity is important for excimer laser, extreme ultraviolet and electron beam resists, but the imaging of NIL and chemical amplification (CA) resists does not directly depend on the sensitivity of polymer resins to ultraviolet irradiation. NIL produces patterns through the mechanical deformation of the resist material under the mould, while CA resist yields patterns by dissolving the material in developer through breaking polymer chains catalyzed by the proton acid generated from the photoacid generator (PAG) under ultraviolet irradiation.…”

“…PMMA and copolymers have good imaging performance and are commonly used as the matrix resin of photoresists for (immersion) ArF excimer laser lithography, as well as EBL and EUVL. 15,20 However, PMMA has some drawbacks, such as low sensitivity, poor dry etching resistance and poor line edge roughness (LER) in images. 17–29…”

“…13 PMMA and copolymers have good imaging performance and are commonly used as the matrix resin of photoresists for (immersion) ArF excimer laser lithography, as well as EBL and EUVL. 15,20 However, PMMA has some drawbacks, such as low sensitivity, poor dry etching resistance and poor line edge roughness (LER) in images. [17][18][19][20][21][22][23][24][25][26][27][28][29] Accordingly, numerous studies have been devoted to improving the relevant properties of PMMA photoresists and some interesting results have been achieved.…”

New structural insights into the role of TROVE2 complexes in the on-set and pathogenesis of systemic lupus erythematosus determined by a combination of QCM-D and DPI

“…The TROVE domain is a doughnut-shape domain consisting of 7 helical HEAT-like repeats [16].The von Willebrand factor A domain is present in a large number of proteins involved in cell adhesion such integrins [17]. The vWFA has a metal ion-dependent adhesion site (MIDAS) motif (D-x-S-x-S…T…D) where divalent cations can bind, rearranging the tertiary structure of the protein and mediating the ligand binding [18].…”