The corrosion of zinc in de-aerated 0.1 M NaCl in the pH range from 1.6 to 13.3

Zembura, Z.; Burzyńska, L.

doi:10.1016/0010-938x(77)90093-2

Cited by 31 publications

(28 citation statements)

References 7 publications

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“…[2] can be written either as i,s -1/2 = kls 1/2 + k2 [3] or i,s -1 = kl + k2s -1/2 [4] It is interesting then to examine how ips -1/2 varies with s 1/2 or ips -1 varies with s -In. [2] can be written either as i,s -1/2 = kls 1/2 + k2 [3] or i,s -1 = kl + k2s -1/2 [4] It is interesting then to examine how ips -1/2 varies with s 1/2 or ips -1 varies with s -In.…”

Section: Resultsmentioning

confidence: 99%

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Zinc Oxidation and Redeposition Processes in Aqueous Alkali and Carbonate Solutions: II . Distinction Between Dissolution and Oxide Film Formation Processes

Conway

Kannangara

1987

J. Electrochem. Soc.

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The early stages of the process of anodic zinc oxidation in CO32-, SO42-, and C1-solutions around pH 11.5, were studied by cyclic voltammetry, as in part I. Unusual peak current dependence on sweep rate is observed at the first anodic peak (As). This behavior is explained in terms of a mixed process involving coupled diffusion and film formation. By correlating the shapes of peaks and peak potentials for different Zn surface preparations, and the relation of the peak current to sweep rate and to electrode rotation rate, r, the roles of film formation and diffusion of solution species are distinguished. A new method of plotting out cyclic voltammetry peak currents, i,, as a function of sweep rate, s, is proposed that treats the anodic currents in terms of parallel components for dissolution into solution, with diffusion (proportional to sl/2), and for film formation or reduction (proportional to s). This allows a separation of diffusion-controlled and film formation currents to be made. The RDE experiments yield i, = A + Br '/2 and sweep rate experiments showed iD = k,s + k2s '/2 relations apply to the i, for the A, peak. Two processes therefore take place: diffusion-controlled dissolution and direct film formation. The importance of studies at single-crystal surfaces is stressed where resolution of the various processes involved is much clearer. Thus, it is shown that only the direct oxide film formation process is predominant at the single-crystal Zn (0001) face. This compact film is responsible for passivation. The results enable a model for dissolution and coupled-film formation, associated with passivation, at the Zn electrode, to be suggested. The participation 6f these two types of process depends on pH and the types of ions present. ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 155.69.4.4 Downloaded on 2015-06-21 to IP Vol. 134, No. 4 ZINC OXIDATION AND REDEPOSITION PROCESSES II ) unless CC License in place (see abstract). ecsdl.org/site/terms_use address. Redistribution subject to ECS terms of use (see 155.69.4.4 Downloaded on 2015-06-21 to IP

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Section: Resultsmentioning

confidence: 99%

“…[3]). A series of experiments were carried out with increasing and decreasing rotation rate to study the effect of rotation on the i,s 1/2 vs. s 1/~ plots (Eq.…”

Section: Resultsmentioning

confidence: 99%

Zinc Oxidation and Redeposition Processes in Aqueous Alkali and Carbonate Solutions: II . Distinction Between Dissolution and Oxide Film Formation Processes

Conway

Kannangara

1987

J. Electrochem. Soc.

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“…3. Thus, there are two competing reactions involving ZnO film dissolution, as described below [11,[16][17][18]:…”

Section: Resultsmentioning

confidence: 99%

Nanostructuration and band gap emission enhancement of ZnO film via electrochemical anodization

et al. 2014

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A C C E P T E D M A N U S C R I P T ACCEPTED MANUSCRIPT2 We report fabrication of nanostructured zinc oxide (ZnO) thin films with improved optical properties through electrochemical anodization. The ZnO films were produced over silicon substrates via radio-frequency (RF) plasma magnetron sputtering technique followed by electrochemical treatment in potassium sulfate solution. After electrochemical treatment, the effect of applied potential on the band gap emission behavior of ZnO films was investigated for the potential drop of 1.8, 2.4 and 3.0 V against reference electrode of Ag/AgCl/0.1M KCl. Depending on these values, ZnO films with different degrees of nonporous morphology, improved structural quality and oxygenrich surface chemistry were obtained. The treatment also resulted in enhancement of band gap emission from ZnO films with the degree of enhancement depending on the applied potential. As compared to the as-deposited films, a maximum increase in the photoemission intensity by more than 2.2 times was noticed. In this paper, any changes in the structure, surface chemistry and band gap emission intensity of the RF sputter deposited films, as induced by the anodization treatment at differential potential values, are discussed.

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“…The pH value and dissolved oxygen have big influences on the zinc corrosion (Zembura and Burzynska, 1977;Zhang, 2008) and zinc reactivity on contaminant (Salter-Blanc and Tratnyek, 2011), so the two influences were examined. To understand the reaction process better, the solution pH changes and the dissolution of zinc ion over the experiment duration were also recorded (Fig.…”

Section: Effect Of Ph and Dissolved Oxygenmentioning

confidence: 99%