The coupling of electron thermalization and electron attachment in CCl4/Ar and CCl4/Ne mixtures

Kowari, Ken-ichi; Leung, Ki; Shizgal, Bernie D.

doi:10.1063/1.475353

Cited by 19 publications

(16 citation statements)

References 52 publications

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“…The attachment cross section of Hayashi [11] agree very well with those reported by Ken-ichi Kowari et al [12]. The attachment cross section of Hayashi [11] agree very well with those reported by Ken-ichi Kowari et al [12].…”

Section: The Formation and Motion Of CCL 4 In Ccl4 -Ar Mixture Introdsupporting

confidence: 83%

The Formation and Motion of CCl[sub 4]−] in CCl4 - Ar Mixture

Martı́nez¹,

Yousif

2006

AIP Conference Proceedings

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Dynamic Faraday cup signal analysis and the measurement of energetic ions emitted by plasma focus Phys. Plasmas 21, 033504 (2014); 10.1063/1.4867175 Studies of the mechanism of the cluster formation in a thermally sampling atmospheric pressure ionization mass spectrometer Rev. Sci. Instrum. 85, 014102 (2014); 10.1063/1.4854855Nuclear magnetic resonance studies on the rotational and translational motions of ionic liquids composed of 1ethyl-3-methylimidazolium cation and bis(trifluoromethanesulfonyl)amide and bis(fluorosulfonyl)amide anions and their binary systems including lithium salts Abstract. This article deals with the measurement of the mobility of negative ions in the mixtures of CCl 4 with Ar with the CCl 4 ratio up to 33.3%. The Pulsed Townsend Technique was employed to produce an integrated ionic avalanches over a range of the density-reduced electric field E/N for which ionization is either negligible or absent, and attachment processes are dominant, leading to the formation of mostly CCl -4 . The E/N range of measurement was 1 to 50 Td (1Td = 10 -17 Vcm 2 ). Our measurements strongly suggest that attachment is the dominant process and only negative ions are formed.

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Section: The Formation and Motion Of CCL 4 In Ccl4 -Ar Mixture Introdsupporting

confidence: 83%

The Formation and Motion of CCl[sub 4]−] in CCl4 - Ar Mixture

Martı́nez¹,

Yousif

2006

AIP Conference Proceedings

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“…In the calculations for argon we use the momentum transfer cross section constructed by Kowari, Leung and Shizgal 19 and shown in Fig. 1 of their paper.…”

Section: Resultsmentioning

confidence: 99%

Electron-ion recombination in dense rare gases: Energy diffusion theory vs simulation

Wojcik

Tachiya

2000

The Journal of Chemical Physics

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Articles you may be interested inData analysis process of a toroidal analyzer for electron-ion collision experiments Rev.Electron-ion recombination rate constants in dense gaseous argon and krypton: Effects of electric field strength and the addition of N 2 or CH 4Effect of an external electric field on diffusion-controlled bulk electron-ion recombination in high-mobility systems An analytical method using the concept of diffusion in energy space is applied to calculate the electron-ion recombination rate constant and the electron escape probability in dense gaseous argon and krypton. The results are compared with the respective data obtained from computer simulations. The discrepancies between the two methods are found to be relatively small. The applicability of the energy diffusion approach is discussed.

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“…The electron-SF 6 collision cross sections are reasonably well known and analytic expressions for the cross sections have been reported [10][11][12]. In a recent paper [13], we presented a detailed study of the coupling of electron thermalization and electron attachment kinetics in CCl 4 /Ar and CCl 4 /Ne mixtures. The motivation of the earlier paper, which overlaps some of the objectives of this paper, was to study the way in which the attachment process affects the electron relaxation times.…”

Section: Introductionmentioning

confidence: 94%

“…The study of the thermalization of electrons in atomic and molecular moderators is an important field of study and has a long history. Detailed reviews of the present status of the field that also provide a bibliography of previous works were presented by Braglia [16] and by Shizgal et al [17] as well as in the previous paper [13]. A complete bibliography can be found in these papers.…”

Section: Introductionmentioning

confidence: 97%

Electron attachment kinetics coupled to electron thermalization in SF6/Ar mixtures

Shizgal

Kowari²

2002

J. Phys. D: Appl. Phys.

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The relaxation of a nonequilibrium distribution of electrons in a mixture of SF6 and Ar is studied. In this paper, electron-SF6 and electron-inert gas elastic collisions, vibrationally inelastic collisions between electrons and SF6, as well as the electron attachment reaction with SF6 are included in the analysis. The time-dependent electron energy distribution function is determined from the Boltzmann equation and the energy relaxation times are determined. The coupling of the thermalization process and the attachment process are discussed in detail. The results from the calculations (for 300 K and a total pressure of 1 Torr) are analysed analogous to experimental studies, and the methodology of the experimental reduction of the data is studied.

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The coupling of electron thermalization and electron attachment in CCl4/Ar and CCl4/Ne mixtures

Cited by 19 publications

References 52 publications

The Formation and Motion of CCl[sub 4]−] in CCl4 - Ar Mixture

The Formation and Motion of CCl[sub 4]−] in CCl4 - Ar Mixture

Electron-ion recombination in dense rare gases: Energy diffusion theory vs simulation

Electron attachment kinetics coupled to electron thermalization in SF6/Ar mixtures

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