The digital structural analysis of cadmium selenide crystals by a method of ion beam thinning for high resolution electron microscopy

Kanaya, K.; Baba, Norio; Naka, Michiaki; Kitagawa, Yukihisa; Suzuki, Kunio

doi:10.1016/0739-6260(86)90020-1

Cited by 6 publications

(4 citation statements)

References 22 publications

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“…The digital structural analysis method previously described by Kanaya et al (1982aKanaya et al ( , 1983aKanaya et al ( ,b, 1984, which was applied t o images from specimens obtained with the aid of an argon-ion thinning technique (Kanaya et al, 1972), was successfully developed for the study of cadmium selenide and the observation of lattice defects (Kanaya et al, 1986a). Figure 7 shows the digital processing used.…”

Section: Digital Structural Analysis Of Cadmium Selenide Crystals By mentioning

confidence: 99%

Digital image processing of crystalline specimens examined by electron microscopy

Kanaya

1988

J. Elec. Microsc. Tech.

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Crystalline specimens imaged in the electron microscope are analysed using digital processing. Some principles of structural analysis using the method of Fourier decomposition are discussed. Complementary techniques, such as enhancement by gradient and Laplacian operators, have been found useful in analysing electron micrographs. The application of these techniques to some problems in Materials Science and Biology are reviewed. By selecting and phase-correcting spots in the computed diffraction pattern, it was possible to localize atoms, molecules, and their defective arrangement in evaporated gold, sputter-deposited tungsten films, and single crystals of cadmium selenide. Digital processing based on the theory of helical diffraction was used to explore the three-dimensional arrangement of molecules in cellular components of alveolar soft part sarcoma, Hirano bodies, and neurofibrillar tangles in the human brain.

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Section: Digital Structural Analysis Of Cadmium Selenide Crystals By mentioning

confidence: 99%

Digital image processing of crystalline specimens examined by electron microscopy

Kanaya

1988

J. Elec. Microsc. Tech.

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“…The digital structure analysis method (Kanaya et al, 198213, 1983a(Kanaya et al, 198213, ,b, 1984 with the aid of the argon-ion thinning technique (Kanaya et al, 1986) has been successfully utilized for studies of cadmium selenide and defect image observations.…”

Section: Ion-beam Thinningmentioning

confidence: 99%

“…In some cases, the charged particles sputtering are filtered by deflector (Kanaya et al, 1982b). Figure 1 shows the ion beam sputtering apparatus (a), in which the working chamber @) was improved to satisfactorily provide the miscellaneous operational features such as atomic shadowing (Kanaya et al, 1974;Adachi et al, 1976), uncoated observation, and etching of biological speci- mens coupled with tungsten sputter coating (Kanaya et al, 1982a,b) and thinning of solid materials (Boyde, 1974;Suzuki et al, 1983;Kanaya et al, 1986).…”

Section: Introductionmentioning

confidence: 99%

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Application of ion beam sputtering for high‐resolution electron microscopy

Kanaya

Baba

Muranaka

et al. 1986

J. Elec. Microsc. Tech.

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Ion beam sputtering for high-resolution electron microscopy has basically provided miscellaneous operational features such as atomic shadowing, uncoated observation, and etching of biological specimens coupled with tungsten sputter coating and thinning of solid materials.Based on the power-potential law of Lindhard for ionic impact phenomena on metal surfaces, the universal yield-energy relationship has been derived. Thereby the sputtering deposition rate with reference to the sputtering removal rate was obtained as a function of sputtering yield, and the most important angular distribution of sputtering yield could be measured by using the hemicylindrical specimen stage.Evidence is presented to show that ion beam sputtering has become one of the most powerful tools for high-resolution electron microscopy.

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