“…Figures 2a and 2b depict the significant and negative moderating effect of host country IPR protection, which further provides support for H3a and H3b. Consistent with previous studies (Martínez-Noya and García-Canal, 2011;Wang et al, 2019b), we further evaluated the marginal effects of knowledge and economic distance on overseas R&D intensity under the context of low or high IPR protection (i.e., Mean ± 1 SD). The results (see Table 5) show that the marginal effects of knowledge and economic distance on overseas R&D intensity are positive and significant (β = 0.015, P < .05; β = 0.027, P < .05) when IPR protection is low; however, the marginal effects are negative and significant (β = − 0.006, P < .05; β = − 0.007, P < .01) when IPR protection is high.…”