2020
DOI: 10.1134/s1063785020120172
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The Effect of a Saturable Absorber in Long-Wavelength Vertical-Cavity Surface-Emitting Lasers Fabricated by Wafer Fusion Technology

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Cited by 15 publications
(11 citation statements)
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“…3, a). The observed WAC nonlinearity can be caused by both the sharp increase in the diffraction losses at the BTJ mesa periphery [24] as well as by the formation of the saturating absorber outside the BTJ mesa region (taking into account the lateral current spreading) [25]. The increase in the external temperature of the laser results in amplification of the WAC nonlinearity effect and lasing disappearance at the temperatures > 40 • C. As the light scattering/diffraction on the refraction index heterogeneities weakly depends on the external temperature, it can be suggested that it is mainly contributed by the light absorption at the resonance wavelength in the unpumped parts of the active region, which is sharply amplifying as the maximum of the amplification spectrum of the active region approaches the resonance wavelength of the microresonator.…”
Section: Resultsmentioning
confidence: 99%
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“…3, a). The observed WAC nonlinearity can be caused by both the sharp increase in the diffraction losses at the BTJ mesa periphery [24] as well as by the formation of the saturating absorber outside the BTJ mesa region (taking into account the lateral current spreading) [25]. The increase in the external temperature of the laser results in amplification of the WAC nonlinearity effect and lasing disappearance at the temperatures > 40 • C. As the light scattering/diffraction on the refraction index heterogeneities weakly depends on the external temperature, it can be suggested that it is mainly contributed by the light absorption at the resonance wavelength in the unpumped parts of the active region, which is sharply amplifying as the maximum of the amplification spectrum of the active region approaches the resonance wavelength of the microresonator.…”
Section: Resultsmentioning
confidence: 99%
“…The lateral current and optical confinements were realized in within the BTJ concept [21] by formation in the composite In 0.53 Ga 0.47 As/In 0.53 Al 0.16 Ga 0.31 As of the tunnel junctions of small mesas of the diameter of 4−8 µm by chemical etching of the n ++ -and p ++ -In 0.53 Ga 0.47 As layers with subsequent epitaxial re-growth of the surface relief by the n-InP layer with the modulated doping profile [17]. The mesa etching depth was selected as a compromise between the high output optical power in the single-mode lasing and suppression of the effect of the saturating absorber in the non-pumped parts of the active region, which occurs in a relatively weak transverse optical confinement [22]. It should be noted that the epitaxial growth of the initial heterostructures of the optical resonator and the DBRs as well as the burial process have been implemented by the MBE method on the industrial unit Riber 49.…”
Section: Experimental Samplesmentioning
confidence: 99%
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“…При использовании концепции захороненного ТП степень поперечного оптического ограничения зависит от латерального размера мезы ЗТП и глубины травления ТП, а также модификации поверхностного рельефа, сформированного в слоях ТП, при его последующем заращивании внутрирезонаторным контактным слоем. Были проведены соответствующие расчеты в рамках упрощенной двумерной модели пятиступенчатого эффективного волновода [31]. Для исследуемой конструкции СП−ВИЛ величина Ŵ tr для фундаментальной моды оказывается близка к 100% для широкоапертурных приборов (диаметр мезы ЗТП ≥ 6 µm).…”
Section: результаты и их обсуждениеunclassified
“…In wide-aperture lasers (in lasers with large TJ diameter), the main contribution to the level of internal optical losses is made by optical losses on free carriers and interband absorption [2]. However, in narrow-aperture lasers, along with the increase in losses depending on the light diffraction, the saturable absorber effect manifests itself, which was previously discovered in the WF-VCSEL in the spectral range 1.55 µm [10] and is due to a decrease in the transverse optical confinement for the fundamental fashion. The effect increases as the size of the BTJ mesa and/or the TJ etching depth decrease, and it also depends on the magnitude of the spectral detuning of the optical gain maximum and the resonant wavelength of the VCSEL.…”
mentioning
confidence: 99%