The effect of deposition parameters on structure, mechanical and adhesion properties of a-C:H on Ti6Al4V with gradient Ti-a-C:H:Ti interlayer

Nißen, Stefan; Heeg, Jan; Warkentin, Mareike; Behrend, D.; Wienecke, M.

doi:10.1016/j.surfcoat.2017.03.020

Cited by 27 publications

(8 citation statements)

References 69 publications

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“…Capacitively coupled RF (CCRF) discharges in hydrocarbon (HC) containing mixtures have been the subject of interest for many decades [1], [2], [3]. These discharges were indeed used fairly early for the deposition of a variety of (multi-)functional carbon, i.e., Diamond-Like-carbon(DLC) [4] or TaC [5], and hydrogen-carbon coatings (aC:H) [6] with applications in a large number of fields such as tribology [7], diffusion barriers [8], anti-corrosion coatings [9], adhesion-enhancement [6], nanocomposites elaboration [10], biomedical [11], just to cite few examples. Although the carbon deposits elaborated by HC-containing discharges enable reaching a large number of functionalities, the physical properties and functional characteristics of the deposits are usually highly sensitive to the process characteristics.…”

Section: Introductionmentioning

confidence: 99%

Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges

Tetard

Prasanna

Mougenot

et al. 2021

Plasma Sources Sci. Technol.

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We investigated capacitively coupled Ar/C 2 H 2 RF plasmas with a 1D fluid model that couples a 13.56 MHz discharge module, a long timescale chemical module and a flow transport module. A new solution procedure was developed in order to accurately describe the coupling between the short timescale discharge dynamics and the long characteristic time processes that play a major role in the molecular growth of reactive species. The plasma was simulated for different inlet gas configurations and flowrates. We showed that for a showerhead configuration one may distinguish two situations. For short residence time the plasma was strongly electronegative in the very center of the discharge gap and dominated by large hydrocarbon positive and negative ions. In this situation the acetylene conversion, although moderate, lead to a significant molecular growth. For long residence time, although C 2 H 2 underwent a total conversion, the products of the primary C 2 H 2 dissociation process were consumed by surface deposition which reduced drastically the molecular growth in the short gap discharge considered here. Whatever the conditions, we confirmed the key-role of Ar* in the acetylene conversion, ionization kinetics as well as the subsequent molecular growth for neutral and charged species. We also showed that remote feed gas and showerhead configurations predicted similar results at low flowrate. At larger flowrate the two configurations presented some discrepancy. Especially H 2 density was much larger for the remote feed gas configuration, which affected the overall plasma behavior. Our results highlight that realistic gas-flow models are essential for an accurate description of acetylene conversion in Ar/C 2 H 2 plasma.

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Section: Introductionmentioning

confidence: 99%

Discharge dynamics, plasma kinetics and gas flow effect in argon–acetylene discharges

Tetard

Prasanna

Mougenot

et al. 2021

Plasma Sources Sci. Technol.

View full text Add to dashboard Cite

show abstract

“…Test results demonstrated the good tribological properties of coatings in that case as well. Further works [4,12,16,18] concerning research on the properties of multi-layer a-C:H:W coatings and of WC/C coatings also confirm the reduction of the wear of the elements to which low-friction coatings were applied. sciENcE aNd tEchNology…”

Section: Introductionmentioning

confidence: 66%