2012
DOI: 10.1016/j.matlet.2012.07.068
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The effect of different etching modes on the smoothing of the rough surfaces

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Cited by 7 publications
(4 citation statements)
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“…Profile evolution simulators have been used to predict the evolution and explore origins of the surface roughness during plasma etching. Cell-based methods [13][14][15][16][17][18][19][20][21][22], molecular dynamics (MD) simulations [23][24][25] and the level set method [26][27][28][29][30][31] have been used to examine the evolution of surface roughness.…”
Section: Introductionmentioning
confidence: 99%
See 1 more Smart Citation
“…Profile evolution simulators have been used to predict the evolution and explore origins of the surface roughness during plasma etching. Cell-based methods [13][14][15][16][17][18][19][20][21][22], molecular dynamics (MD) simulations [23][24][25] and the level set method [26][27][28][29][30][31] have been used to examine the evolution of surface roughness.…”
Section: Introductionmentioning
confidence: 99%
“…The evolving profile or surface are determined as the zero contour of the level set function. By using the level set method, Radjenović et al [26][27][28][29] studied the evolution of surface roughness (roughening or smoothing) during isotropic, anisotropic etching and physical sputtering of homogeneous and nonhomogeneous films. In our previous works [30,31], the level set method was used to explore the evolution of a rough polymeric substrate during physical sputtering by argon ions, taking into account the effects of surface charging, ion reflection and secondary electronelectron emission.…”
Section: Introductionmentioning
confidence: 99%
“…Profile evolution simulators have been used to predict the evolution and explore origins of the surface roughness during plasma etching: Cell-based methods [52,[85][86][87][88][89][90][91][92][93], molecular dynamics simulations [19,94,95] and the level set method [82,83,[96][97][98][99][100] have been encompassed for the evolution of surface roughness.…”
Section: Modeling Of Plasma Induced Surface Roughnessmentioning
confidence: 99%
“…It relies on the concept of the implicit function; the evolving profile or surface is determined as the zero contour of the level set function. By using the level set method, Radjenović et al [96][97][98][99] studied the evolution of surface roughness (roughening or smoothing) during isotropic, anisotropic etching and physical sputtering of homogeneous and nonhomogeneous films. A more extensive review in recent developments in theoretical/numerical and experimental studies of the formation and evolution of surface roughness can be found elsewhere [52].…”
Section: Modeling Of Plasma Induced Surface Roughnessmentioning
confidence: 99%