2019
DOI: 10.1088/2053-1591/ab240a
|View full text |Cite
|
Sign up to set email alerts
|

The effect of fabrication conditions on 2DEGs transport characteristics at amorphous-LaAlO3/KTaO3 interfaces

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1

Citation Types

2
9
0

Year Published

2022
2022
2024
2024

Publication Types

Select...
5

Relationship

1
4

Authors

Journals

citations
Cited by 11 publications
(11 citation statements)
references
References 31 publications
2
9
0
Order By: Relevance
“…It is worth mentioning here that the a-LAO/KTO device ( O2 P = 1 × 10 −2 Torr) was highly insulating even before the IL gating process, consistent with the previous reports. [22] We, however, observed similar results before and the after IL gating effect on a-LAO/KTO device, for which a-LAO is grown at three other different O2 P (10 −3 , 10 −4 , 10 −5 Torr). The lower R s at low temperature after IL gating is most likely due to the decreasing of the density of oxygen vacancies, which act as scattering centers and cause the relatively high resistance before gating.…”
Section: Ionic-liquid Gatingsupporting
confidence: 74%
See 2 more Smart Citations
“…It is worth mentioning here that the a-LAO/KTO device ( O2 P = 1 × 10 −2 Torr) was highly insulating even before the IL gating process, consistent with the previous reports. [22] We, however, observed similar results before and the after IL gating effect on a-LAO/KTO device, for which a-LAO is grown at three other different O2 P (10 −3 , 10 −4 , 10 −5 Torr). The lower R s at low temperature after IL gating is most likely due to the decreasing of the density of oxygen vacancies, which act as scattering centers and cause the relatively high resistance before gating.…”
Section: Ionic-liquid Gatingsupporting
confidence: 74%
“…The lower R s at low temperature after IL gating is most likely due to the decreasing of the density of oxygen vacancies, which act as scattering centers and cause the relatively high resistance before gating. [22,30] A similar effect has also been reported for the 2DEG at the a-LAO/STO interface. [29] The striking influence of IL gating is evident in the Hall resistance variations, as shown in Figure 2b,c.…”
Section: Ionic-liquid Gatingsupporting
confidence: 69%
See 1 more Smart Citation
“…A careful optimization of the fabrication conditions (substrate temperature and oxygen pressure) for the LAO‐KTO thin films led to the observation of several emergent phenomena. [ 166 ] Lower temperatures and higher oxygen pressures favored higher metallicity of the interface. The value of the Fermi energy above which two types of charge carriers existed was also calculated.…”
Section: Low‐dimensional Electron Gas In Ktao3: Surfaces and Interfacesmentioning
confidence: 99%
“…They are also potentially interesting from the point of view of oxide electronics and spintronics. [45,46,166]…”
Section: Pulsed Laser Depositionmentioning
confidence: 99%