2016
DOI: 10.1007/s00339-016-9844-x
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The effect of light-induced plasma on propagation of intense fs laser radiation in c-Si

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Cited by 16 publications
(21 citation statements)
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“…3b). As will be shown below, and according to [2,3], at sufficient pulse energy and increased thickness of the c-Si sample, actual shape of the pump beam becomes distorted by TPA and plasma refraction. Indeed, we found, that in 8-mm-thick c-Si sample, where the shape of the pump beam, focused on the exit face of the sample, is surely not Gaussian, the profile of TH emission acquires a ring component (Fig.…”
Section: Third Harmonic Generation By the Fs Laser Pulses At 1550 Nm mentioning
confidence: 97%
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“…3b). As will be shown below, and according to [2,3], at sufficient pulse energy and increased thickness of the c-Si sample, actual shape of the pump beam becomes distorted by TPA and plasma refraction. Indeed, we found, that in 8-mm-thick c-Si sample, where the shape of the pump beam, focused on the exit face of the sample, is surely not Gaussian, the profile of TH emission acquires a ring component (Fig.…”
Section: Third Harmonic Generation By the Fs Laser Pulses At 1550 Nm mentioning
confidence: 97%
“…TH was also generated in photonic crystal waveguides as a result of spatial pulse compression involving the slow light phenomenon [12,13]. However, as far as we know, reports on THG in bulk c-Si at λ p = 1550 nm, visible by naked eye, are missing, despite the fact that THG in this material is an allowed process, in which third-order nonlinear polarization P (3) (3ω) at the tripled frequency is given by [7]: P (3)…”
Section: Third Harmonic Generation By the Fs Laser Pulses At 1550 Nm mentioning
confidence: 99%
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