1998
DOI: 10.1021/bk-1998-0695.ch026
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The Effect of Macromolecular Architecture on the Thin Film Aqueous Base Dissolution of Phenolic Polymers for Microlithography

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Cited by 6 publications
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“…This block copolymer formation proved to be a general procedure and permitted a wide compositional range of polystyrene- b -poly(isoprene) block copolymers to be prepared with accurate control of molecular weight up to 105 000 amu and polydispersities typically in the range of 1.13−1.20 (Table ). The advantage of greater availability and a significantly greater tolerance of functional groups suggest a number of potential technological applications for these novel materials.
4
4 Comparison of GPC traces for (a) the starting poly( tert -butyl acrylate) polymer, 5 , and (b) the poly( tert -butyl acrylate)- b -polyisoprene block copolymer, 6 , obtained after chain extension with isoprene.
…”
Section: Resultsmentioning
confidence: 99%
“…This block copolymer formation proved to be a general procedure and permitted a wide compositional range of polystyrene- b -poly(isoprene) block copolymers to be prepared with accurate control of molecular weight up to 105 000 amu and polydispersities typically in the range of 1.13−1.20 (Table ). The advantage of greater availability and a significantly greater tolerance of functional groups suggest a number of potential technological applications for these novel materials.
4
4 Comparison of GPC traces for (a) the starting poly( tert -butyl acrylate) polymer, 5 , and (b) the poly( tert -butyl acrylate)- b -polyisoprene block copolymer, 6 , obtained after chain extension with isoprene.
…”
Section: Resultsmentioning
confidence: 99%