2016
DOI: 10.1016/j.apsusc.2015.11.200
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The effect of Mo on the characteristics of a plasma nitrided layer of sintered iron

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Cited by 13 publications
(2 citation statements)
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“…26−30 Among them, metallic molybdenum nitride (MoN) is widely used in the field of optoelectronic devices because of its superconductivity and excellent electron transfer ability. 31,32 MoN also has an electronic structure very similar to those of platinum-group elements; therefore, it is also a promising platinum-like catalyst. 33,34 It should be pointed out that although molybdenum nitride has a high concentration of free electrons, it rarely shows a significant localized SPR effect.…”
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confidence: 99%
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“…26−30 Among them, metallic molybdenum nitride (MoN) is widely used in the field of optoelectronic devices because of its superconductivity and excellent electron transfer ability. 31,32 MoN also has an electronic structure very similar to those of platinum-group elements; therefore, it is also a promising platinum-like catalyst. 33,34 It should be pointed out that although molybdenum nitride has a high concentration of free electrons, it rarely shows a significant localized SPR effect.…”
mentioning
confidence: 99%
“…As a class of important semiconductor materials, transition-metal nitrides (TMNs) have been widely used in various fields due to their excellent photocatalytic properties, high electrical conductivity, and superb mechanical properties. Among them, metallic molybdenum nitride (MoN) is widely used in the field of optoelectronic devices because of its superconductivity and excellent electron transfer ability. , MoN also has an electronic structure very similar to those of platinum-group elements; therefore, it is also a promising platinum-like catalyst. , It should be pointed out that although molybdenum nitride has a high concentration of free electrons, it rarely shows a significant localized SPR effect. This is mainly because the traditional preparation conditions of MoN are extremely harsh, requiring high-temperature and high-pressure conditions to overcome the huge reaction barrier in the nucleation process.…”
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confidence: 99%