The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering

Arnell, R.D.; Colligon, J.S.; Minnebaev, K. F.; Yurasova, V. E.

doi:10.1016/0042-207x(95)00241-3

Cited by 41 publications

(10 citation statements)

References 24 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In general, the thin film hardness is affected by the mechanical properties of the underlying substrate. 32,33 Also, the films with maximum hardness contain a minimum of TiN x and oxynitrides as is evident from the XPS studies. It should be noted that the Ti/BN system achieves higher hardness ͑H v 3500͒ after annealing at 1400 rather than at 1000°C ͑see Table I͒.…”

Section: Microhardness Of the Composite Filmsmentioning

confidence: 77%

Effect of temperature on Ti and TiN films deposited on a BN substrate

Seal

Underwood

Uda

et al. 1998

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

Optimization of hardness by the control of microwave power in TiN thin film deposited by electron cyclotron resonance assisted sputtering in a nitrogen plasma J. Vac. Sci. Technol. A 17, 2535 (1999); 10.1116/1.581993 X-ray photoelectron spectroscopy study of the chemical interaction between BN and Ti/TiN J. Vac. Sci. Technol. A 15, 505 (1997); 10.1116/1.580881 Combined x-ray photoelectron/Auger electron spectroscopy/glancing angle x-ray diffraction/extended x-ray absorption fine structure investigation of TiB x N y coatings

show abstract

Section: Microhardness Of the Composite Filmsmentioning

confidence: 77%

Effect of temperature on Ti and TiN films deposited on a BN substrate

Seal

Underwood

Uda

et al. 1998

Journal of Vacuum Science &Amp; Technology A: Vacuum, Surfaces, and Films

View full text Add to dashboard Cite

show abstract

“…The component N1 at 396.9 eV is typical for both TiN and CrN and, in this particular case, forms around 86% of the overall nitrogen peak area. The component N2 at 399.0 eV is usually ascribed to metal oxynitrides [26].…”

Section: Resultsmentioning

confidence: 99%

Ion assisted deposition of titanium chromium nitride

et al. 2006

View full text Add to dashboard Cite

“…In order to obtain a good fit for the Ti 2p line during deconvolution, it is necessary in all cases to introduce additional components at a higher binding energy of the sputter-cleaned samples. These additional contributions to the Ti 2p envelop for TiN thin films have been the subject of several discussions and are usually attributed either to Ti 2 O 3 or TiO 2 , 8,13,16 -18 to titanium oxynitrides with different stoichiometry 17 or to a loss peak. 16,19,20 In the deconvolution of the Ti 2p spectra proposed in this paper, the 456.85 eV peak is assigned to a loss peak and the 458.5 eV peak is attributed to an oxide (Fig.…”

Section: Characterization Of the Films By Xpsmentioning

confidence: 99%

Nitrogen plasma pressure influence on the composition of TiN_xO_y sputtered films

Guillot

Jouaiti²,

Imhoff

et al. 2002

Surface & Interface Analysis

View full text Add to dashboard Cite

Thin films of TiN x O y were deposited by d.c. magnetron sputtering on glass substrates using an (Ar + ,N 2 ) plasma and Ti target. The N 2 partial pressure was changed from 2.3 × 10 −4 mbar to 4.6 × 10 −3 mbar in order to obtain films with increasing nitrogen contents. X-ray photoelectron spectroscopy was used to determine the as-deposited composition. The presence of oxygen, which is probably due to contamination from the residual atmosphere in the vacuum chamber, is always detected, both in the surface layers and in the bulk of the films, confirming the formation of TiN x O y . When the nitrogen partial pressure was increased, a maximum for the nitrogen content in the films was reached, corresponding to a TiN 0.8 O 0.4 film composition. The nitrogen content of the films did not increase further for higher N 2 partial pressures. X-ray diffraction showed that each deposited layer had a rock salt structure, isomorphic to that for TiN, in which some nitrogen atoms would seem to be substituted by oxygen atoms in the anionic sub-lattice. Moreover, this crystalline TiN x O y phase is super-stoichiometric with this deposition method. To the best of our knowledge such results have already been observed on TiN films but it is the first time that they have been presented for TiN x O y thin layers.

show abstract

The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering

Cited by 41 publications

References 24 publications

Effect of temperature on Ti and TiN films deposited on a BN substrate

Effect of temperature on Ti and TiN films deposited on a BN substrate

Ion assisted deposition of titanium chromium nitride

Nitrogen plasma pressure influence on the composition of TiN_xO_y sputtered films

Contact Info

Product

Resources

About

The effect of nitrogen content on the structure and mechanical properties of TiN films produced by magnetron sputtering

Cited by 41 publications

References 24 publications

Effect of temperature on Ti and TiN films deposited on a BN substrate

Effect of temperature on Ti and TiN films deposited on a BN substrate

Ion assisted deposition of titanium chromium nitride

Nitrogen plasma pressure influence on the composition of TiNxOy sputtered films

Contact Info

Product

Resources

About

Nitrogen plasma pressure influence on the composition of TiN_xO_y sputtered films