2008
DOI: 10.1016/j.tsf.2008.05.050
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The effect of oxygen incorporation in sputtered scandium nitride films

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Cited by 77 publications
(60 citation statements)
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“…As mentioned in Ref. 30, the affinity of O to ScN is high in comparison to other TM nitrides, which is supported by these observations. Also, the films with high amounts of O exhibit a significantly higher concentration of C and H impurities, which supports the idea of postgrowth indiffusion along grain boundaries under atmospheric conditions.…”
Section: Resultssupporting
confidence: 85%
See 1 more Smart Citation
“…As mentioned in Ref. 30, the affinity of O to ScN is high in comparison to other TM nitrides, which is supported by these observations. Also, the films with high amounts of O exhibit a significantly higher concentration of C and H impurities, which supports the idea of postgrowth indiffusion along grain boundaries under atmospheric conditions.…”
Section: Resultssupporting
confidence: 85%
“…[20][21][22][23] Experimentally the synthesis of c-ScN as thin films is reported with different techniques including reactive magnetron sputter epitaxy ͑MSE͒, 27 radio frequency molecular beam epitaxy, 28 and chemical vapor deposition. 29 Moram et al 30 showed that ScN has a high affinity to oxygen compared to other TM nitrides. High amounts of impurities are probably the reason for the variation in the experimentally measured properties and their variation from theoretical predictions.…”
Section: Introductionmentioning
confidence: 99%
“…For electrical properties, theoretical studies reported that ScN is an indirect semiconductor with energy gap in the range of 0.9-1.6 eV. [5][6][7][8][9] Measurements on as-deposited ScN show n-type behavior, 10,11 and the carrier concentration of ScN has been reported to vary from 10 18 to 10 22 cm À3 with electron mobility of 100-180 cm 2 V À1 s À1 . 9,[12][13][14] These numbers of the carrier concentrations span the typical ideal range for thermoelectrics 1 while retaining a high carrier mobility; 13 a fact relevant to their thermoelectric power factor reported here.…”
mentioning
confidence: 99%
“…ScN is an indirect gap semiconductor with the rock-salt structure and has been of interest recently for thermoelectric device applications [25][26][27][28][29][30]. ScN-based interlayers are also of use as dislocation-blocking layers in the growth of epitaxial GaN films [31][32][33].…”
Section: Introductionmentioning
confidence: 99%