The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications

Song, Hooyoung; Jeon, Hosang; Shin, Changhee; Shin, Sunmi; Jang, Woochool; Park, Joo Hyun; Chang, Jaewan; Choi, Jae Hyoung; Kim, Younsoo; Lim, H.; Seo, Hyungtak; Jeon, Hyeongtag

doi:10.1016/j.tsf.2016.10.044

Cited by 14 publications

(6 citation statements)

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“…In general, three polymorphs are known for ZrO 2 : monoclinic (<1170 • C), tetragonal (1170-2370 • C), and cubic (>2370 • C) [5]. ZrO 2 is a widely studied material, due to its special properties, such as a wide ban gap (5.1-7.8 eV) [6], a dielectric constant (12)(13)(14)(15)(16)(17)(18)(19)(20)(21)(22)(23)(24)(25) [7,8], good mechanical strength [9], high thermal expansion coefficient [10], and excellent hydrophilic properties [11].…”

Section: Introductionmentioning

confidence: 99%

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

et al. 2020

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Zirconium oxide (ZrO2) thin films were prepared by the sol-gel dip coating technique, in combination with annealing at different temperatures in air atmosphere, with the final goal of studying the water wettability of the surface. The annealing effects on the structural and optical properties of the ZrO2 films were investigated to check the characteristics of the material. X-ray diffraction (XRD) patterns of ZrO2 annealed at 450 °C and 550 °C show the formation of tetragonal phase, with layers constituted by nanoparticles with average particle size of 21 nm and 25 nm, respectively. Fourier-transform infrared spectroscopy (FT-IR) spectra revealed the presence of vibrational modes associated to ZrO2. Photoluminescence (PL) and ultraviolet-visible spectroscopy (UV–Vis) spectroscopy was used for optical properties. All deposited ZrO2 thin films presented a high optical transparency, with an average transmittance above 70% in the visible range (400–700 nm). The hydrophilic properties of ZrO2 films were characterized by means of the measurements of the contact angle. When the sample was annealed at 550 °C, the hydrophilicity reached the best behavior, which was explained as an effect of the structural and morphological change of the films.

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Section: Introductionmentioning

confidence: 99%

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

et al. 2020

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“…The oxygen peak at 531.5 eV was assigned to the surface oxygen (denoted as O I in figure 1(c)) and the oxygen peak at 529.7 eV was assigned to the lattice oxygen (denoted as O II in figure 1(c)) [23]. Due to the non-stoichiometric nature of the ZrO 2 ALD, the ZrO 2 ALD contained weak (hydroxyls), medium (metal-oxygen pair), and strong basic sites (oxygen vacancy defect) due to the surface oxygen species [24,25], whereas the main oxygen species for CZA was reported as weak basic sites (hydroxyl group) [26]. From the O 1s peak signal in figure 1(c), both the lattice oxygen and the surface oxygen increased, as compared to the fresh CZA catalyst.…”

Section: Resultsmentioning

confidence: 99%

Ultra-thin ZrO₂ overcoating on CuO-ZnO-Al₂O₃ catalyst by atomic layer deposition for improved catalytic performance of CO₂ hydrogenation to dimethyl ether

Fan

Jin

et al. 2023

Nanotechnology

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An ultra-thin overcoating of zirconium oxide (ZrO2) film on CuO-ZnO-Al2O3 (CZA) catalysts by atomic layer deposition (ALD) was proved to enhance the catalytic performance of CZA/HZSM-5 (H form of Zeolite Socony Mobil-5) bifunctional catalysts for hydrogenation of CO2 to dimethyl ether (DME). Under optimal reaction conditions (i.e., 240 °C and 2.8 MPa), the yield of product DME increased from 17.22% for the bare CZA/HZSM-5 catalysts, to 18.40% for the CZA catalyst after 5 cycles of ZrO2 ALD with HZSM-5 catalyst. All the catalysts modified by ZrO2 ALD displayed significantly improved catalytic stability of hydrogenation of CO2 to DME reaction, compared to that of CZA/HZSM-5 bifunctional catalysts. The loss of DME yield in 100 hrs of reaction was greatly mitigated from 6.20% (loss of absolute value) to 3.01% for the CZA catalyst with 20 cycles of ZrO2 ALD overcoating. Characterizations including hydrogen temperature programmed reduction, X-ray powder diffraction, and X-ray photoelectron spectroscopy revealed that there was strong interaction between Cu active centers and ZrO2.

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“…[10] Recently, it was reported that tetragonal ZrO 2 could be deposited at temperatures below 400 °C using atomic layer deposition (ALD). [11][12][13] ALD technology is suitable for DRAM capacitor deposition due to superior uniformity, excellent conformity, and atomic-scale controllability. Various precursors have been proposed for high-k ZrO 2 thin-film ALD; Cyclopentadienyl tris(dimethylamino) zirconium (CpZr(NMe 2 ) 3 ) precursor has high thermal stability and high growth rate, and many studies are being conducted.…”

Section: Introductionmentioning

confidence: 99%

Characteristics of High‐Crystallinity ZrO₂Thin Films Deposited Using Remote Plasma Atomic Layer Deposition

Song

Jung

Kim

et al. 2022

Physica Status Solidi (a)

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ZrO2 deposition using the plasma‐enhanced atomic layer deposition (PEALD) process with a cyclopentadienyl tris(dimethylamino) zirconium (CpZr(NMe2)3) precursor is investigated. The effect of deposition temperature and plasma power on ZrO2 thin films’ bonding and electrical properties is studied. CpZr(NMe2)3 is used for the deposition at 100 W and 200–400 °C and at 50–1000 W at 300 °C. When generating O2 plasma, Ar gas and O2 gas are used together to generate more radicals. It is found that CpZr(NMe2)3's PEALD process window is 200–300 °C and the film's crystallinity is strongly influenced by deposition temperature and plasma power. In both process conditions, only the tetragonal phase changes. As a result, the ZrO2 film deposited at 50 W and 300 °C has the highest dielectric constant. This is due to the higher O radical ratio that corresponds to lower plasma power. A high O radical ratio causes a chemical reaction rather than an ion bombardment.

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The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications

Cited by 14 publications

References 30 publications

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

Ultra-thin ZrO₂ overcoating on CuO-ZnO-Al₂O₃ catalyst by atomic layer deposition for improved catalytic performance of CO₂ hydrogenation to dimethyl ether

Characteristics of High‐Crystallinity ZrO₂Thin Films Deposited Using Remote Plasma Atomic Layer Deposition

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The effect of ozone concentration during atomic layer deposition on the properties of ZrO2 films for capacitor applications

Cited by 14 publications

References 30 publications

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

The Influence of Annealing Temperature on the Structural and Optical Properties of ZrO2 Thin Films and How Affects the Hydrophilicity

Ultra-thin ZrO2 overcoating on CuO-ZnO-Al2O3 catalyst by atomic layer deposition for improved catalytic performance of CO2 hydrogenation to dimethyl ether

Characteristics of High‐Crystallinity ZrO2Thin Films Deposited Using Remote Plasma Atomic Layer Deposition

Contact Info

Product

Resources

About

Ultra-thin ZrO₂ overcoating on CuO-ZnO-Al₂O₃ catalyst by atomic layer deposition for improved catalytic performance of CO₂ hydrogenation to dimethyl ether

Characteristics of High‐Crystallinity ZrO₂Thin Films Deposited Using Remote Plasma Atomic Layer Deposition