The effect of the backscattered energetic atoms on the stress generation and the surface morphology of reactively sputtered vanadium nitride films

Sarakinos, Kostas; Alami, Jones; Severin, D.; Karimi, Patrick M.; Wuttig, Matthias

doi:10.1016/j.tsf.2007.06.016

Cited by 6 publications

(6 citation statements)

References 24 publications

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“…However, Sarakinos et al. 35 explained this result by the change in the micro/nanostructure of carbon based compounds, which possessed similar tribological parameters. Compared with the friction coefficient of CrN coating (0·55), the Cr–V–N coatings have a slightly lower friction coefficient of ∼0·39.…”

Section: Resultsmentioning

confidence: 99%

“…In addition, similar results were obtained for ternary Ti-V-N coatings by Latella et al, 9 who explained this correlation by the dynamical behaviour of dislocations with the vanadium substitution of titanium atoms in the film structure. However, Sarakinos et al 35 explained this result by the change in the micro/nanostructure of carbon based compounds, which possessed similar tribological parameters. Compared with the friction coefficient of CrN coating (0?55), the Cr-V-N coatings have a slightly lower friction coefficient of *0?39.…”

Section: Friction Coefficientmentioning

confidence: 99%

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Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Aissani¹,

Nouveau²,

Walock³

et al. 2015

Surface Engineering

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This work aims to show the characterisation of Cr-V-N coatings, with the varied amounts of Cr and V. CrN, VN and Cr-V-N coatings were deposited onto silicon and XC100 steel substrates by reactive radio frequency magnetron sputtering and characterised with X-ray diffraction, X-ray photoelectron spectroscopies, energy dispersive X-ray spectroscopy, scanning electron microscopy, nanoindentation, pin on disc tribological tests and scratch tests. The residual stress was calculated using the Stoney formula. Compared to the CrN system, the Cr-V-N films presented a rough surface based on pyramidal morphology. A hardness of 19?53 GPa and a friction coefficient of 0?55 were obtained for CrN; in contrast, Cr-V-N coatings presented a weak hardness of 6?23 GPa. In the case of wear against a 100Cr6 ball, the Cr-V-N films were completely removed from the substrate, even though the Cr-V-N coating presented a low friction coefficient (0?39). However, the VN film showed good tribological performance.

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Section: Resultsmentioning

confidence: 99%

Section: Friction Coefficientmentioning

confidence: 99%

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Aissani¹,

Nouveau²,

Walock³

et al. 2015

Surface Engineering

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“…In particular, no direct correlation between vanadium nitride microstructural properties, influenced by sputtering deposition parameters, and electrical as well as electrochemical performance was evidenced so far. Thin films properties, such as electronic conductivity, morphology, density, hardness, stress, preferential orientation, crystal structures, were well known to be strongly dependent on the parameters associated to sputtered thin film formation . As a matter of fact, electrochemical properties of such thin films can be tuned with the deposition parameters.…”

Section: Introductionmentioning

confidence: 99%

On Chip Interdigitated Micro‐Supercapacitors Based on Sputtered Bifunctional Vanadium Nitride Thin Films with Finely Tuned Inter‐ and Intracolumnar Porosities

Robert

Douard

Demortière

et al. 2018

Adv Materials Technologies

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and cycling ability high. Most of the studies in the field were performed on electrical double layer capacitors or on EC based on pseudocapacitive transition metal oxides (MnO 2 , RuO 2 , FeWO 4 ). Pseudocapacitance is used to explain the charge storage mechanism in a capacitive electrode where the storage process arises from fast redox reactions with no phase transformation of the electrode material. Pseudocapacitance is Faradaic in origin, involving the passage of charge across the double layer, as in battery charging or discharging, but capacitance arises on account of the special relation that can originate for thermodynamic reasons between the extent of charge acceptance (ΔQ) and the change of potential (ΔV), so that a derivative d(ΔQ)/d(ΔV), which is equivalent to a capacitance, can be formulated and experimentally measured by dc, ac, or transient techniques. While this process is basically different from ion accumulation in porous carbon electrodes, the signature of the pseudocapacitive material is characterized by triangular shape constant current charge/discharge plots and quasirectangular shape cyclic voltammograms. Only a few number of papers focused on nitride-based supercapacitors although, Conway [2] et al. demonstrated in 1988 the potential use of molybdenum nitride pseudocapacitive material acting as an efficient electrode for electrochemical capacitors.Micro-supercapacitors (MSC) are considered as promising miniaturized electrochemical energy storage devices for Internet of Things applications. Unfortunately, the technological readiness level of these devices is still at the lab scale with the development of individual prototypes due to the difficulty to produce high performance porous electrode material with microelectronic equipment available in pilot production lines. Here, the collective fabrication of on chip MSC based on sputtered porous vanadium nitride (VN) bifunctional material is reported. For the first time in the field of MSC, the porosity of the sputtered VN thin films is fine-tuned at the nanoscale level in order to produce high capacitance and high conductive electrodes. Interdigitated MSC based on optimized VN thin films are fabricated on silicon wafers using microelectronic facilities. 2 μWh cm −2 /10 mWh cm −3 energy densities are reached while keeping a high power density (10 mW cm −2 />50 W cm −3 ) owing to high electrical conductivity of VN layers. Sputtered vanadium nitride thin films are demonstrated to be suitable pseudocapacitive electrodes and highly conductive current collectors for MSC applications. These findings represent a major advance in order to go toward the large-scale deployment of such miniaturized power sources. Micro-SupercapacitorsThe ORCID identification number(s) for the author(s) of this article can be found under https://doi.

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“…It is shown that when the energy of the incident species on the film surface is low, their energy transfers to the surface of the growing film and affects the surface roughness [5,31,32]. On the other hand, the species are supplanted into the film when their energy increases, which, in turn, forms higher internal stresses [33][34][35][36].…”

Section: Discussionmentioning

confidence: 99%

A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies

Khamseh

Nosé

Kawabata

et al. 2010

Journal of Alloys and Compounds

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The effect of the backscattered energetic atoms on the stress generation and the surface morphology of reactively sputtered vanadium nitride films

Cited by 6 publications

References 24 publications

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

Influence of vanadium on structure, mechanical and tribological properties of CrN coatings

On Chip Interdigitated Micro‐Supercapacitors Based on Sputtered Bifunctional Vanadium Nitride Thin Films with Finely Tuned Inter‐ and Intracolumnar Porosities

A comparative study of CrAlN films synthesized by dc and pulsed dc reactive magnetron facing target sputtering system with different pulse frequencies

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