Computer simulations of one-dimensional multi-fluid equations are used to study the effects of C 2 H 4 addition on the plasma chemistry and formation of nanoparticles in a capacitively coupled Ar/C 2 H 2 plasma. The results indicate that the most important effect is an enhanced production of hydrogen-rich species, especially C 4 H 4 . Regarding the effect of C 2 H 4 inlet on different routes of nanoparticles nucleation, it was found that the nucleation via growth of neutral molecules is significantly suppressed, while the radicals and anions remain almost unaffected. As C 2 H 4 participates in many cationic reactions, the concentrations of hydrogen-rich cations are largely enhanced, whereas those of carbon-rich cations are reduced. The numerical results also suggest that the main mechanism behind the production of C 6 H 6 is the insertion of the C 2 H 3 radical into C 4 H 4 . The concentrations of the precursors species of C 6 H 6 are increased with an increase in the pressure but are reduced with the applied RF voltage.