The effects of oxygen concentration in sputter-deposited molybdenum films

Bardin, Thomas; Pronkoz, J.G.; Budhani, R. C.; Lin, J.S.; Bunshah, R.F.

doi:10.1016/0040-6090(88)90695-5

Cited by 28 publications

(6 citation statements)

References 3 publications

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“…The resistivity of our films is much lesser than the values reported (~ 40-80 -cm) for the Mo films with comparable or larger crystallite sizes [8,27,30]. The effect of oxygen contamination during the film growth upon its electrical properties is well documented [12,19,20]. The reduced sheet resistance and resistivity of the films in present work could be attributed to lesser oxygen contamination due to increase in the deposition rate and repulsion of negative oxygen ions away from the growing films [20].…”

Section: Resultsmentioning

confidence: 72%

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Sharma¹,

Abhirami²,

Amaladass³

et al. 2018

Mater. Res. Express

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The negative bias on the substrate during DC sputter deposition of nano-crystalline molybdenum thin films has been utilized to tune their properties for solar cells and the cryogenic radiation detector applications. Films have been deposited on Si substrates under different out of plane negative biases aiming to improve their physical properties such as the sheet resistance, superconducting transition temperature, width of transition and surface roughness. Significant modifications in the electrical and surface morphological properties of nano-crystalline Mo thin films have been reported. The superconducting transition temperature and crystallite size of the films does not show much improvement but the surface roughness and electrical resistivity of the film have been improved by the application of substrate bias.

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Section: Resultsmentioning

confidence: 72%

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Sharma¹,

Abhirami²,

Amaladass³

et al. 2018

Mater. Res. Express

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“…The changes in the resistivity of Mo films were attributed to the degree of oxygen contamination and microstructural modifications during growth. This explanation was sustained by Bardin et al [2] who showed that the electrical resistivity of Mo films decreases as the amount of oxygen contamination decreases at higher deposition rates. Yamaghuchi and Miyagawa [9] showed also that the sputtered Mo thin films microstructures and stresses were affected by oxygen.…”

Section: Introductionmentioning

confidence: 85%

“…Because of its low resistivity and high melting point, sputterdeposited thin films of molybdenum (Mo) are increasingly being used as the gate electrode in GaAs-based metal gate field effect transistors (MESFETs) and silicon-based metal-oxidesemiconductor (MOS) devices [2,4,5,9]. Successful performance of Mo as the gate electrode was found to be affected by the deposition conditions.…”

Section: Introductionmentioning

confidence: 99%

Preparation and characterization of DC sputtered molybdenum thin films

Kashyout

Soliman

Abou-Gabal

et al. 2011

Alexandria Engineering Journal

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Molybdenum (Mo) thin films have been deposited on soda-lime glass substrates using a DC magnetron sputtering system. Their electrical resistivity, and their morphological, structural and adhesive properties have been examined with respect to the deposition power, deposition time and substrate temperature. The electrical resistivity of the Mo films could be reduced by increasing any of the above parameters. Within the range of the investigated deposition parameters, the films showed a mono-crystalline nature with a preferred orientation along the (1 1 0) plane. The Mo films adhesion to the soda-lime glass could be improved by increasing the substrate temperature. At a deposition power of 200 W, deposition time of 20 min and substrate temperature of 450°C, Mo thin film exhibiting mono-crystalline structure with thickness equal to 450 nm and electrical resistivity equal to 1.85 · 10 À4 X cm was obtained.ª 2011 Faculty of Engineering, Alexandria University. Production and hosting by Elsevier B.V.All rights reserved.

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“…Similar surface morphologies have been reported previously for the Mo films deposited using magnetron sputtering 23,[30][31][32] . The effect of impurities on the morphology and physical properties of Mo thin films has already been reported 33,34 . For metals like Mo with atoms having low surface mobility, the presence of impurities like O2 and water vapor further hinder the grain growth during film deposition.…”

Section: Crystal Structure and Surface Morphologymentioning

confidence: 91%

Studies on DC transport and terahertz conductivity of granular molybdenum thin films for microwave radiation detector applications

Sharma

Khandelwal

Amaladass

et al. 2020

Journal of Applied Physics

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The morphological, transport and terahertz optical properties of DC magnetron sputtered granular molybdenum thin-films with nano-grains embedded in an amorphous matrix have been studied in the normal and superconducting states. The superconducting transition temperatures of these films are much higher than that of bulk molybdenum. The optical properties of these thin-films have been studied using terahertz time-domain spectroscopy. Their properties have been compared with the existing materials used for the development of radiation detectors. The resistivity of the films lies in >100 µΩ-cm range which is ideal for making highly sensitive radiation detectors. The Hall measurements indicate the presence of holes as the dominant carriers with very small mean free path and mobility. In the normal state, the films are disordered bad metal but they have large superfluid density and stiffness in their superconducting state. The normal state and superconducting properties of the films are very promising for their use in cryogenic radiation detectors for microwave, terahertz, and far IR frequency ranges.

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The effects of oxygen concentration in sputter-deposited molybdenum films

Cited by 28 publications

References 3 publications

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Negative substrate bias induced modifications of the physical properties of DC sputter deposited nano-crystalline Mo thin films

Preparation and characterization of DC sputtered molybdenum thin films

Studies on DC transport and terahertz conductivity of granular molybdenum thin films for microwave radiation detector applications

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