2009
DOI: 10.1016/j.mejo.2008.06.015
|View full text |Cite
|
Sign up to set email alerts
|

The effects of quantum dot coverage in InAs/(In)GaAs nanostructures for long wavelength emission

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

5
22
0

Year Published

2010
2010
2022
2022

Publication Types

Select...
6
1

Relationship

0
7

Authors

Journals

citations
Cited by 17 publications
(27 citation statements)
references
References 17 publications
5
22
0
Order By: Relevance
“…The metamorphic InAs/InGaAs QD structure consists of (i) 0.1 μm n + -GaAs buffer layer grown at 600 °C, (ii) 300 nm thick n + -doped In 0.15 Ga 0.85 As MB with n  = 5 × 10 18  cm −3 grown at 490 °C, (iii) 500 nm thick n -doped In 0.15 Ga 0.85 As MB with n  = 3 × 10 16  cm −3 grown at 490 °C, (iv) 3.0 monolayers of self-assembled InAs QDs on a WL grown by atomic layer MBE (ALMBE) at 460 °C embedded in the middle of a 20 nm undoped In 0.15 Ga 0.85 As layer, (v) 300 nm n -doped In 0.15 Ga 0.85 As upper capping layer with n  = 3 × 10 16  cm −3 grown at 490 °C, and (vi) 13 nm p + -doped In 0.15 Ga 0.85 As cap with p  = 2 × 10 18  cm −3 grown at 490 °C (Fig. 1) [4, 15]. As discussed in Ref.…”
Section: Methodsmentioning
confidence: 99%
“…The metamorphic InAs/InGaAs QD structure consists of (i) 0.1 μm n + -GaAs buffer layer grown at 600 °C, (ii) 300 nm thick n + -doped In 0.15 Ga 0.85 As MB with n  = 5 × 10 18  cm −3 grown at 490 °C, (iii) 500 nm thick n -doped In 0.15 Ga 0.85 As MB with n  = 3 × 10 16  cm −3 grown at 490 °C, (iv) 3.0 monolayers of self-assembled InAs QDs on a WL grown by atomic layer MBE (ALMBE) at 460 °C embedded in the middle of a 20 nm undoped In 0.15 Ga 0.85 As layer, (v) 300 nm n -doped In 0.15 Ga 0.85 As upper capping layer with n  = 3 × 10 16  cm −3 grown at 490 °C, and (vi) 13 nm p + -doped In 0.15 Ga 0.85 As cap with p  = 2 × 10 18  cm −3 grown at 490 °C (Fig. 1) [4, 15]. As discussed in Ref.…”
Section: Methodsmentioning
confidence: 99%
“…The QD density depends on several growth parameters, such as InAs coverage [5,6,10], InAs growth rate [5,7], As-flux [3,8] and substrate temperature [2,3,9]. The QD density variation observed in our samples could thus in principle be caused by variation in any of these parameters across the wafer.…”
Section: Discussionmentioning
confidence: 93%
“…Earlier works have shown how the MBE growth parameters strongly influence the quantum dot properties, see e.g. [2][3][4][5][6][7][8][9][10][11].…”
Section: Introductionmentioning
confidence: 99%
“…The influence of InAs coverage on the InAs QDs grown on GaAs substrates has been reported [20,21]. In summary, the effects of InAs coverage can be classified into 4 different regimes: (1) at low InAs coverage (0-1.7 ML), the QDs are yet to be formed; (2) when the InAs coverage exceeds a critical value ( $ 1.7 ML), the QD density increases abruptly; (3) as the InAs coverage continues to increase, the QD density and QD dimensions first increase in a gradual manner and then saturate and (4) eventually, the QD density decreases and the dot width increases when dot coalescence occurs.…”
Section: Effects Of Inas Coveragementioning
confidence: 99%