2020
DOI: 10.21203/rs.3.rs-40179/v1
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The Epitaxy of 2D materials growth

Abstract: A general theoretical framework for the epitaxial growth of a 2D material on an arbitrary substrate was proposed. Our extensive density functional theory (DFT) calculations show that the propagating edge of a 2D material tends to align along a high symmetry direction of the substrate and, as a conclusion, the interplay between the symmetries of the 2D material and the substrate plays a critical role in the epitaxial growth of the 2D material. Based on our results, we have outlined that unidirectional align-men… Show more

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Cited by 2 publications
(2 citation statements)
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“…36 The primary benet of epitaxy is homogeneity in composition, controlled growth parameters, and a better knowledge of the development process itself. 37 GaN is always grown on a foreign substrate; thus, it follows a heteroepitaxial growth. 38,39 For the formation of the epilayers of III-V compound semiconductors and other materials, several epitaxial processes have been applied.…”
Section: Introductionmentioning
confidence: 99%
“…36 The primary benet of epitaxy is homogeneity in composition, controlled growth parameters, and a better knowledge of the development process itself. 37 GaN is always grown on a foreign substrate; thus, it follows a heteroepitaxial growth. 38,39 For the formation of the epilayers of III-V compound semiconductors and other materials, several epitaxial processes have been applied.…”
Section: Introductionmentioning
confidence: 99%
“…However, many fundamental challenges should be resolved before 2D TMDCs meet the industry criteria for practical applications in electronics. For example, the large-area growth of single crystals to decrease defective grain boundaries 9,10 , the effective doping of 2D TMDCs to modulate band structures 11,12 , and the optimization design of interfaces to reduce contact resistances [13][14][15][16][17][18] . Therein, controllable synthesis and effective doping of wafer-scale 2D TMDCs single crystals are two central tasks for extending Moore's law beyond silicon.…”
Section: Introductionmentioning
confidence: 99%