The First Development of Photoelectron Spectroscopy and Its Relation to HAXPES

Svensson, S.; Sokolowski, E.; Mårtensson, Nils

doi:10.1007/978-3-319-24043-5_2

Cited by 4 publications

(3 citation statements)

References 10 publications

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“…This activity has been recently reviewed by two of the authors of this report, in collaboration with one of the pioneers; Evelyn Sokolowski. 11,12 IV. GAME CHANGER: THE DISCOVERY OF THE CORE-LEVEL CHEMICAL SHIFT During a relatively long period, photoelectron spectroscopy was performed only by this small group in Uppsala.…”

Section: Birth Of Escamentioning

confidence: 99%

Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy

Mårtensson

Föhlisch

Svensson

2022

Journal of Vacuum Science &Amp; Technology A

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The development of modern photoelectron spectroscopy is reviewed with a special focus on the importance of research at Uppsala University and at Berkeley. The influence of two pioneers, Kai Siegbahn and Dave Shirley, is underlined. Early interaction between the two centers helped to kick-start the field. Both laboratories have continued to play an important role in the field, both in terms of creating new experimental capabilities and developing the theoretical understanding of the spectroscopic processes.

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Section: Birth Of Escamentioning

confidence: 99%

Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy

Mårtensson

Föhlisch

Svensson

2022

Journal of Vacuum Science &Amp; Technology A

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“…On the downside, the very bright X‐ray beam at the synchrotron can easily induce unwanted degradation in volatile and metastable materials, even for short irradiation times. In recent years, HAXPES at the synchrotron has been very successfully applied to characterize buried interfaces and bulk‐like chemical and electronic structures of thin‐film devices, catalysts, and other functional materials 13–15 . However, comprehensive chemical state studies by HAXPES at the synchrotron in dependence of the synthesis, processing, and/or environmental exposure conditions are rare, 16 which can be attributed to limited access and measurement time at synchrotron facilities and the resulting lack of a direct feedback loop between synthesis and characterization.…”

Section: Introductionmentioning

confidence: 99%

Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

Siol

Mann²,

Newman³

et al. 2020

Surface & Interface Analysis

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The greater information depth provided in Hard X-ray Photoelectron Spectroscopy (HAXPES) enables non-destructive analyses of the chemistry and electronic structure of buried interfaces. Moreover, for industrially relevant elements like Al, Si and Ti, the combined access to the Al 1s, Si 1s or Ti 1s photoelectron line and its associated Al KLL, Si KLL or Ti KLL Auger transition, as required for local chemical state analysis on the basis of the Auger parameter, is only possible with hard X-rays. Until now, such photoemission studies were only possible at synchrotron facilities. Recently however, the first commercial XPS/HAXPES systems, equipped with both soft and hard X-ray sources, have entered the market, providing unique opportunities for monitoring the local chemical state of all constituent ions in functional oxides at different probing depths, in a routine laboratory environment. Bulksensitive shallow core-levels can be excited using either the hard or soft X-ray source, whereas more surface-sensitive deep core-level photoelectron lines and associated Auger transitions can be measured using the hard X-ray source. As demonstrated for thin Al2O3, SiO2 and TiO2 films, the local chemical state of the constituting ions in the oxide may even be probed at near constant probing depth by careful selection of sets of photoelectron and Auger lines, as excited with the combined soft and hard X-ray sources. We highlight the potential of lab-based HAXPES for the research on functional oxides and also discuss relevant technical details regarding the calibration of the kinetic binding energy scale. Supporting information:Advanced chemical state studies of oxide films by lab-based HAXPES combining soft and hard X-ray sources

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“…In this paper CuKα (8.6 keV) and CrKα (5.4 keV) radiation were used to excite the spectra. ESCA used HAXPES excitation energies in the beginning and this point has recently been reviewed [4,5].…”

Section: Introductionmentioning

confidence: 99%

HAXPES studies of solid materials for applications in energy and information technology using the HIKE facility at HZB-BESSY II

Gorgoi

Mårtensson

Svensson

2015

Journal of Electron Spectroscopy and Related Phenomena

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The First Development of Photoelectron Spectroscopy and Its Relation to HAXPES

Cited by 4 publications

References 10 publications

Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy

Uppsala and Berkeley: Two essential laboratories in the development of modern photoelectron spectroscopy

Concepts for chemical state analysis at constant probing depth by lab‐based XPS/HAXPES combining soft and hard X‐ray sources

HAXPES studies of solid materials for applications in energy and information technology using the HIKE facility at HZB-BESSY II

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