1991
DOI: 10.1016/0022-0248(91)91112-n
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The growth and electronic properties of α-Sn thin films grown on InSb(100) and () substrates by molecular beam epitaxy (MBE)

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Cited by 8 publications
(3 citation statements)
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“…films, 43,44 strained-layer superlattices of InSb/InAlSb 45 as well as ␣-Sn films 46,47 have been grown on InSb substrates treated by this method. This treatment produces a smooth surface passivated by an oxide layer low in carbon content and easy to remove by in situ thermal desorption.…”
Section: Resultsmentioning
confidence: 99%
“…films, 43,44 strained-layer superlattices of InSb/InAlSb 45 as well as ␣-Sn films 46,47 have been grown on InSb substrates treated by this method. This treatment produces a smooth surface passivated by an oxide layer low in carbon content and easy to remove by in situ thermal desorption.…”
Section: Resultsmentioning
confidence: 99%
“…It should be mentioned that the approach described can be useful for other analogous systems with several carrier species, for example heterojunctions of α-Sn/InSb [14] and InSb/CdTe [15].…”
Section: Experimental Results and Analysismentioning
confidence: 99%
“…For instance, epitaxial RT growth of ␣-Sn films is feasible on InSb͑001͒ substrates (aϭ6.4798 Å) because of close lattice matching. 3,[7][8][9][10][11][12] On the other hand, RT growth of epitaxial ␣-Sn-type overlayers on Si͑111͒ substrates has been observed to be limited to only ϳ3 atomic layers, because the larger lattice misfit ͑Si: aϭ5.4309 Å) favors the transition to ␤-Sn above such low Sn coverages. [13][14][15] In the present work we investigated Sn(t Sn )/Si(t Si ) multilayers of different Sn and Si thicknesses (t Sn and t Si , re-spectively͒.…”
Section: Introductionmentioning
confidence: 99%