The structure and vibrational dynamics of room-temperature-grown nanoscale Sn/amorphous (a-͒Si multilayers have been studied by x-ray diffraction, Raman scattering, 119 Sn Mössbauer spectroscopy, and 119 Sn nuclear-resonant inelastic x-ray scattering ͑NRIXS͒ of synchrotron radiation. With increasing Sn-layer thickness, the formation of -Sn was observed, except at the Sn/Si interfaces, where a 10-Å-thick metastable pure amorphous-␣-Sn-like layer remains stabilized. By means of NRIXS we have measured the Sn-projected vibrational density of states ͑VDOS͒ in these multilayers ͑in particular, at the interfaces͒, and in 500-Å-thick epitaxial ␣-Sn films on InSb͑001͒ as a reference. Further, the Sn-specific Lamb-Mössbauer factor (f factor͒, mean kinetic energy per atom, mean atomic force constant, and vibrational entropy per atom were obtained. The VDOS of the amorphous-␣-Sn-like interface layer is observed to be distinctly different from that of ͑bulk͒ ␣-Sn and -Sn, and its prominent vibrational energies are found to scale with those of amorphous Ge and Si. The observed small difference in vibrational entropy (⌬S/k B ϭϩ0.17Ϯ0.05 per atom͒ between ␣-Sn and interfacial amorphous-␣-like Sn does not account for the stability of the latter phase.