2012
DOI: 10.1016/j.jallcom.2012.01.154
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The illustrated brief application of defect distribution model for heterojunction device by admittance spectroscopy

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Cited by 4 publications
(4 citation statements)
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“…For CdTe, this technique is mostly used to study the often encountered electrical contact problem [8]- [10], the etching procedure effect [11]- [13], and doping effects [14], [15]. Furthermore, this procedure is also widely used in DSSC, perovskite, Cu 2 ZnSnS 4 , and silicon solar cells [16]- [23]. This technique has also been used for CIGS solar cells [24]- [28] for general defects analysis.…”
mentioning
confidence: 99%
“…For CdTe, this technique is mostly used to study the often encountered electrical contact problem [8]- [10], the etching procedure effect [11]- [13], and doping effects [14], [15]. Furthermore, this procedure is also widely used in DSSC, perovskite, Cu 2 ZnSnS 4 , and silicon solar cells [16]- [23]. This technique has also been used for CIGS solar cells [24]- [28] for general defects analysis.…”
mentioning
confidence: 99%
“…Although some density of interfacial state produced by 60 Co and Hot‐carrier Ejection in NMOS have been calculated via energy position in the band gap, this does not give enough idea about verification and validation of the methodology suggested in this paper. To further observe the efficiency and accuracy of the method to any kind of solid evidences available using experimental data, the experimental energy‐depend density of interfacial state of p‐Si/CdS heterojunction is illustrated in Figure . Meanwhile, the density of interfacial state of p‐Si/CdS heterojunction is determined by energy given in Figure .…”
Section: Results and Simulationmentioning
confidence: 99%
“…Measured and modeled the depend density of interfacial state of p‐Si/CdS heterojunction along the energy.…”
Section: Results and Simulationmentioning
confidence: 99%
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