The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

Wang, Ziyi; Zhang, Rongjun; Lu, Hong-Liang; Chen, Xin; Sun, Yun; Zhang, Yun; Wei, Yanfeng; Xu, Jun; Wang, Song-You; Zheng, Yuanzhou; Chen, Liang‐Yao

doi:10.1186/s11671-015-0757-y

Cited by 78 publications

(39 citation statements)

References 32 publications

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“…It was reported that the refractive index is closely related to the density of materials, being lower at lower density. Consequently, the increase in the refractive index is caused by the stress release and densification during the annealing process [38, 39]. Furthermore, for the 20 nm La 2 O 3 film, an abrupt increase in the refractive index could be observed when the annealing temperature increased from 400 to 600 °C, indicating an aggressive enhancement in the packing density upon crystallization.…”

Section: Resultsmentioning

confidence: 99%

Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

et al. 2017

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La2O3 films were grown on Si substrates by atomic layer deposition technique with different thickness. Crystallization characteristics of the La2O3 films were analyzed by grazing incidence X-ray diffraction after post-deposition rapid thermal annealing treatments at several annealing temperatures. It was found that the crystallization behaviors of the La2O3 films are affected by the film thickness and annealing temperatures as a relationship with the diffusion of Si substrate. Compared with the amorphous La2O3 films, the crystallized films were observed to be more unstable due to the hygroscopicity of La2O3. Besides, the impacts of crystallization characteristics on the bandgap and refractive index of the La2O3 films were also investigated by X-ray photoelectron spectroscopy and spectroscopic ellipsometry, respectively.

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Section: Resultsmentioning

confidence: 99%

Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

et al. 2017

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“…AZO thin films were deposited on p-type Si (100) by alternating diethylzinc (Zn(CH 2 CH 3 ) 2 , DEZ; Al(CH 3 ) 3 , TMA) and deionized water (H 2 O) in an ALD reactor (Picosun) at 190 °C. A typical ALD cycle for AZO consisted of 14 single cycles ZnO and 1 single cycle Al-O, while the single cycle of ZnO or Al-O consisted of 0.1 s DEZ or TMA pulse, 5 s N 2 purge, 0.1 s H 2 O pulse, and 5 s N 2 purge according to our previous reports [ 22 – 24 ]. The mechanism of ZnO ALD is the chemical vapor deposition reaction.…”

Section: Methodsmentioning

confidence: 99%

Optical Properties of Al-Doped ZnO Films in the Infrared Region and Their Absorption Applications

Zheng

Zhang

et al. 2018

Nanoscale Res Lett

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The optical properties of aluminum-doped zinc oxide (AZO) thin films were calculated rapidly and accurately by point-by-point analysis from spectroscopic ellipsometry (SE) data. It was demonstrated that there were two different physical mechanisms, i.e., the interfacial effect and crystallinity, for the thickness-dependent permittivity in the visible and infrared regions. In addition, there was a blue shift for the effective plasma frequency of AZO when the thickness increased, and the effective plasma frequency did not exist for AZO ultrathin films (< 25 nm) in the infrared region, which demonstrated that AZO ultrathin films could not be used as a negative index metamaterial. Based on detailed permittivity research, we designed a near-perfect absorber at 2–5 μm by etching AZO-ZnO alternative layers. The alternative layers matched the phase of reflected light, and the void cylinder arrays extended the high absorption range. Moreover, the AZO absorber demonstrated feasibility and applicability on different substrates.

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“…Establishing a precise value of the refractive index for the thin films is challenging, as it depends on the thickness and the growth conditions. Furthermore, some materials exhibit birefringence in the bulk form, whereas the thin films behave as isotropic materials [ 28 , 29 , 30 ].…”

Section: Theorymentioning

confidence: 99%

Low-Coherence Interferometric Fiber-Optic Sensors with Potential Applications as Biosensors

Hirsch

Majchrowicz

Wierzba

et al. 2017

Sensors

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Fiber-optic Fabry-Pérot interferometers (FPI) can be applied as optical sensors, and excellent measurement sensitivity can be obtained by fine-tuning the interferometer design. In this work, we evaluate the ability of selected dielectric thin films to optimize the reflectivity of the Fabry-Pérot cavity. The spectral reflectance and transmittance of dielectric films made of titanium dioxide (TiO 2 ) and aluminum oxide (Al 2 O 3 ) with thicknesses from 30 to 220 nm have been evaluated numerically and compared. TiO 2 films were found to be the most promising candidates for the tuning of FPI reflectivity. In order to verify and illustrate the results of modelling, TiO 2 films with the thickness of 80 nm have been deposited on the tip of a single-mode optical fiber by atomic layer deposition (ALD). The thickness, the structure, and the chemical properties of the films have been determined. The ability of the selected TiO 2 films to modify the reflectivity of the Fabry-Pérot cavity, to provide protection of the fibers from aggressive environments, and to create multi-cavity interferometric sensors in FPI has then been studied. The presented sensor exhibits an ability to measure refractive index in the range close to that of silica glass fiber, where sensors without reflective films do not work, as was demonstrated by the measurement of the refractive index of benzene. This opens up the prospects of applying the investigated sensor in biosensing, which we confirmed by measuring the refractive index of hemoglobin and glucose.

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The impact of thickness and thermal annealing on refractive index for aluminum oxide thin films deposited by atomic layer deposition

Cited by 78 publications

References 32 publications

Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

Structural Properties Characterized by the Film Thickness and Annealing Temperature for La2O3 Films Grown by Atomic Layer Deposition

Optical Properties of Al-Doped ZnO Films in the Infrared Region and Their Absorption Applications

Low-Coherence Interferometric Fiber-Optic Sensors with Potential Applications as Biosensors

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