2006
DOI: 10.1016/j.tsf.2005.08.180
|View full text |Cite
|
Sign up to set email alerts
|

The influence of deposition parameters on the structure and properties of magnetron-sputtered titania coatings

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1
1
1

Citation Types

0
15
0

Year Published

2007
2007
2015
2015

Publication Types

Select...
10

Relationship

1
9

Authors

Journals

citations
Cited by 28 publications
(15 citation statements)
references
References 11 publications
0
15
0
Order By: Relevance
“…The target was 99.5% purity Ti and the reactive sputtering process was controlled by optical emission monitoring (the 503 nm Ti line was monitored and held at 20% of the full metal signal, as this had previously been shown to produce transparent titania coatings [38,39]). After achieving a base pressure of 1 × 10 −3 Pa, argon was introduced to the chamber at 17.7 SCCM.…”
Section: Methodsmentioning
confidence: 99%
“…The target was 99.5% purity Ti and the reactive sputtering process was controlled by optical emission monitoring (the 503 nm Ti line was monitored and held at 20% of the full metal signal, as this had previously been shown to produce transparent titania coatings [38,39]). After achieving a base pressure of 1 × 10 −3 Pa, argon was introduced to the chamber at 17.7 SCCM.…”
Section: Methodsmentioning
confidence: 99%
“…The coatings were deposited at a bias voltage of −40 V. A thin layer of Ti was initially deposited as the adhesion layer prior to the introduction of oxygen to the deposition chamber. The amount of oxygen was controlled using an optical emission monitor, using conditions known to produce stoichiometric TiO 2 [26]. A pulsed-DC power of 2.5 kW was used on the Ti target at frequency 50 kHz and a duty of 97.75% (in synchronous mode).…”
Section: Preparation Of Coated Surfacesmentioning
confidence: 99%
“…Although TiO 2 films have been prepared by various methods such as CVD, evaporation, ion beam assisted processes and reactive magnetron sputtering [6], the sputtering technique is promising under circumstances where low temperature deposition and conformal coatings are needed. However, it's known that low temperatures in depositions difficult the attainment of crystalline materials.…”
Section: Introductionmentioning
confidence: 99%