A Monte-Carlo (MC) simulation is applied to the quantitative
microanalysis of a film/substrate system. The characteristic X-ray
intensity is used in this simulation. However, it is difficult to
determine the film thickness for a multilayer/substrate system which
consists of two elements in this method using characteristic X-ray
intensity only. In order to overcome this difficulty, we utilized the
characteristic Si–L2,3 soft X-ray emission band spectra which
have their own spectral shapes for silicides and Si, and are expected
to be superior to the conventional method using band X-rays only. In
the measurement of the Si–L2,3 spectrum for a silicide/Si system
at a certain incident energy, the obtained Si–L2,3 spectrum
exhibits the increasing characteristic of the film material spectrum
with the increase in film thickness. By using this characteristic,
quantitative analysis using both MC simulation and Si–L2,3
emission band spectra is demonstrated for the CoSi2/Si system in
this study.