2000
DOI: 10.1109/3.890268
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The influence of quantum-well composition on the performance of quantum dot lasers using InAs-InGaAs dots-in-a-well (DWELL) structures

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Cited by 153 publications
(76 citation statements)
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“…11 The DWELL layer is grown in the center of a GaAs waveguide ͑total waveguide thickness of 256 nm͒, which sits atop a 1.5 m thick Al 0.7 Ga 0.3 As buffer layer. The resulting peak of the ground state emission of the ensemble of QDs is located at = 1.35 m at room temperature.…”
mentioning
confidence: 99%
“…11 The DWELL layer is grown in the center of a GaAs waveguide ͑total waveguide thickness of 256 nm͒, which sits atop a 1.5 m thick Al 0.7 Ga 0.3 As buffer layer. The resulting peak of the ground state emission of the ensemble of QDs is located at = 1.35 m at room temperature.…”
mentioning
confidence: 99%
“…Nondestructive material characterization, gain spectra measurements, and SLED device characteristics were all compared for various growth parameters. Seven InAs/InGaAs dot-in-a-well [16] layers separated by 50 nm of GaAs formed the active region of the QD SLED. Waveguiding was provided by doped Al 0.4 Ga 0.6 As cladding layers.…”
Section: Bandwidth Engineering In Qd Devicesmentioning
confidence: 99%
“…In particular, the dots-in-a-well (DWELL) detector architecture pioneered at the University of New Mexico was used as a prototype in these studies 6,7 . The DWELL architecture is a hybrid structure in which InAs quantum dots are placed in an InGaAs quantum well.…”
mentioning
confidence: 99%