The influence of substrate bias voltages on structure, mechanical properties and anti-corrosion performance of Cr doped diamond-like carbon films deposited by steered cathodic arc evaporation

Liang, Chih-Hao; Huang, Cheng-Feng; Tsai, Heng-Yi

doi:10.1016/j.tsf.2015.11.010

Cited by 15 publications

(3 citation statements)

References 30 publications

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“…Although using a substrate bias voltage in the range of 100 V has no significant effect on the ionization volume due to the high degree of ionization of the cathode in the CAE process, applying a bias voltage can facilitate the entry of more positive ions into the plasma sheath. The presence of more positive ions in the sheath results in the bombardment of the growing surface film with higher kinetic energy, leading to more re‐sputtering from the growing film 31 …”

Section: Resultsmentioning

confidence: 99%

“…The presence of more positive ions in the sheath results in the bombardment of the growing surface film with higher kinetic energy, leading to more re-sputtering from the growing film. 31 The application of bias voltage has been utilized by many researchers to improve the nucleation rate and deposition of a denser film. [32][33][34] The main effect of increasing the negative bias voltage is that the deposition growth rate decreases due to the re-sputtering mechanism, which occurs as a result of energetic ion bombardment.…”

Section: Microstructure Investigationmentioning

confidence: 99%

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The effect of substrate bias voltage on the mechanical and electrochemical corrosion properties of multilayered CrN/CrAlN coatings produced by cathodic arc evaporation

Baseri

Mohammadi

Ghatee

et al. 2023

Int J Applied Ceramic Tech

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The Multilayer CrN/CrAlN film was deposited on the SS420 substrate by cathodic arc evaporation technique. The effect of substrate bias‐voltage was investigated on the microstructure, surface morphology, and mechanical and electrochemical corrosion properties of the deposited film. The deposited CrN/CrAlN coatings were characterized by XRD and FESEM techniques. Mechanical properties, corrosion resistance, and surface morphology of the coated samples were studied by nano‐indentation, polarization method, electrochemical impedance spectroscopy, and atomic force microscopy, respectively. Adhesive and dense nanostructure CrN and CrAlN phases were successfully deposited on the substrate. The refinement of the coating crystallite was observed from 31.2 to 24.3 nm by increasing the substrate bias voltage, this improved the mechanical properties of the coating. The number of macroparticles, the number of pinholes and porosities, and the surface roughness of coatings significantly decreased by increasing the substrate bias voltage. The CrN/CrAlN coating reduced the corrosion current density in contrast to the SS420 substrate. Better corrosion resistance was obtained for the coating deposited at 150 V of bias voltage due to lower defects in the film structure.This article is protected by copyright. All rights reserved

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Section: Resultsmentioning

confidence: 99%

Section: Microstructure Investigationmentioning

confidence: 99%

The effect of substrate bias voltage on the mechanical and electrochemical corrosion properties of multilayered CrN/CrAlN coatings produced by cathodic arc evaporation

Baseri

Mohammadi

Ghatee

et al. 2023

Int J Applied Ceramic Tech

View full text Add to dashboard Cite

show abstract

“…Several dopants, both non-metallic [14][15][16] and metallic [17][18][19][20][21][22], have been previously investigated to overcome such drawbacks. Silicon has been reported to have an effect on the residual stresses of the films [23] and reduce the hardness up to a certain silicon content threshold in films without hydrogenated precursors [23,24].…”

Section: Introductionmentioning

confidence: 99%