The influence of titanium interlayers on the adhesion of PVD TiN coatings on oxidized stainless steel substrates

Titanium nitride coatings on copper alloy prepared by dc reactive magnetron sputtering

“…In order to achieve a better adherence of TiN in the substrate [18,19], and based on some preliminary tests, an The deposition of TiN was carried out by means of reactive plasma, using a Leybold-Heraeus equipment and dc planar magnetron sputtering, under different conditions of applied current, Ar/N 2 flow ratio (J Ar /J N 2 ) and bias voltage, as shown in Table 1. The total pressure inside the chamber remained fixed at 0.27 Pa.…”

Residual stresses in titanium nitride thin films obtained with step variation of substrate bias voltage during deposition

“…Plasma nitriding was conducted in an atmosphere of N 2 (4 sccm), H 2 (80 sccm) and Ar (30 sccm), at a pressure of approximately 3 × 10 − 3 Torr, and temperature of 520°C. Then, a titanium interlayer (with thickness ∼100 nm) was deposited in order to have a better TiN adherence to the substrate [36]. Finally, the TiN films were deposited in an atmosphere of N 2 (4 sccm) and Ar (20 sccm) at a temperature of 300°C and pressure of approximately 3.5 × 10 − 3 Torr.…”

Tribological characteristics of Si3N4-based composites in unlubricated sliding against steel ball

“…It is often chosen as a surface coating to improve the tribological characteristics of materials [6][7][8][9][10]. Much study has been carried out on the friction and wear behavior of ceramic against metals and ceramics against ceramics couples in sliding contact.…”