In this paper, a statistical methodology that can be used for the optimization of the Insulator Gate Bipolar Transistor (IGBT) devices is proposed. This is achieved by integrating the response surface method (RSM) with cluster analysis, weighted composite method and genetic algorithm (GA). The device characteristic of IGBT was simulated based upon the fabrication simulator, ATHENA, and the device simulator, ATLAS. This methodology, yielded another way to investigate the IGBT device and to make a decision in the tradeoff between the breakdown voltage and the on-resistance. In this methodology, we also show how to use cluster analysis to determine the dominant factors that are not visible in the screening of all experiments.