The Interaction between Micrometer-size Particles and Flat Substrates: A Quantitative Study of Jump-to-Contact

Gady, B.; Schleef, D.; Reifenberger, R.; Rimai, D. S.

doi:10.1080/00218469808011113

Cited by 31 publications

(15 citation statements)

References 12 publications

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“…In the ultrasonic vibration method, the frequency and hence the force required to detach the particle from the substrate using an ultrasonic probe is measured as described in [7]. The other common advanced force microscopy techniques Journal of Adhesion Science and Technology 22 (2008) are atomic force microscopy (AFM) [8][9][10][11], Lateral/Friction Force Microscopy (FFM) [12,13], Scanning Tunneling Microscopy (STM) [14,15] and Ultra-High Vacuum Atomic Force Microscopy (UHV-AFM) [16,17]. These techniques employ a cantilever tip which is brought near a particle/surface system whose properties have to be measured.…”

Section: Introductionmentioning

confidence: 99%

Adhesion Characterization Based on Rolling Resistance of Individual Microspheres on Substrates: Review of Recent Experimental Progress

Peri

Cetinkaya

2008

Journal of Adhesion Science and Technology

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A review of the recent progress in mechanistic understanding and measurement of the micro-scale particle rolling resistance under the influence of adhesion and external excitations is presented. Two non-contact and one contact experimental approaches to measure the work of adhesion based on the rolling moment resistance of a particle are described. In the non-contact configurations, the microsphere is subjected to an external transient force field either by exciting the base of the surface to which the particle is adhered by a contact piezoelectric transducer or by exciting the particle and the substrate together by an air-coupled acoustic transducer. The vibration of the microsphere due to the excitation force field is measured by an interferometer in a non-contact manner. The natural frequency of the rocking motion of the microsphere is deduced from the measured transient waveforms. In the contact experiments, an atomic force microscope (AFM) tip is used to accurately push the particle with a controlled force in a chamber of a scanning electron microscope (SEM) to measure the rolling resistance of the particle prior to its rolling and sliding. The applied force is directly recorded and the displacement of the microsphere is determined by analyzing the SEM images of the rolling particle. The force-displacement curves are used for characterizing the work of adhesion of the microsphere-substrate bond. Experimental results using these three configurations are compared with the available data in the literature and good agreement between the theoretical predictions and the experimental values is reported.  Koninklijke Brill NV, Leiden, 2008

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Section: Introductionmentioning

confidence: 99%

Adhesion Characterization Based on Rolling Resistance of Individual Microspheres on Substrates: Review of Recent Experimental Progress

Peri

Cetinkaya

2008

Journal of Adhesion Science and Technology

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“…The force microscopy techniques used to measure the force of adhesion during adhesion, include atomic force microscopy (AFM) [15][16][17][18], lateral/friction force microscopy (FFM) [19,20], scanning tunneling microscopy (STM) and ultra-high vacuum atomic force microscopy (UHV-AFM) [21,22]. In most of these techniques, a cantilever tip is brought near a particle/surface whose properties have to be measured.…”

Section: Introductionmentioning

confidence: 99%

Non-contact microsphere–surface adhesion measurement via acoustic base excitations

Peri

Cetinkaya

2005

Journal of Colloid and Interface Science

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“…Although such a eld could be obtained under the small separation distances and vacuum conditions encountered in that study, there would have to be electrostatic discharge under more normal conditions, giving rise to weaker electrostatic contributions to the eld. Finally, Gady et al [63] measured the jump-to-contact distance and determined that electrostatic forces were minor contributors to the total force needed to overcome the stiffness of the cantilever at nanometer separation distances even for highly charged particles. In summary, these results argue that, even allowing for the localized charged patch effects, at the close separation distances encountered when a particle is in contact with the photoconductor, van der Waals forces dominate over electrostatic interactions for isolated particles.…”

Section: Forces Controlling Toner Adhesion: Van Der Waals or Electrosmentioning

confidence: 99%

Particle adhesion and removal in electrophotography

Rimai¹,

Weiss²,

Quesnel³

2003

Journal of Adhesion Science and Technology

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Particle adhesion and removal is often controlled by the interplay of electrostatic forces, related to electrical charges on the particles, and electrodynamic forces, such as those arising from van der Waals interactions. In addition, when electrostatically detaching a charged particle from a substrate, the manner in which the electric eld is applied can alter the charge on the particle, thus changing both the attractive and detachment forces. The effects are clearly illustrated in the transfer of a toned image from the photoconductor in an electrophotographic engine. This paper reviews present day understanding of the interplay between electrostatic and electrodynamic interactions, as they occur within the electrophotographic process, and presents the results of previous studies in a uni ed manner.

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The Interaction between Micrometer-size Particles and Flat Substrates: A Quantitative Study of Jump-to-Contact

Cited by 31 publications

References 12 publications

Adhesion Characterization Based on Rolling Resistance of Individual Microspheres on Substrates: Review of Recent Experimental Progress

Adhesion Characterization Based on Rolling Resistance of Individual Microspheres on Substrates: Review of Recent Experimental Progress

Non-contact microsphere–surface adhesion measurement via acoustic base excitations

Particle adhesion and removal in electrophotography

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