1998
DOI: 10.1088/0953-2048/11/2/007
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The microstructure and electrical properties of thin films processed at low temperatures

Abstract: thin films on (001) with excellent alignment suitable for microwave applications at 77 K have been fabricated using an ex situ anneal step in argon atmospheres at temperatures of . Surface resistance values as low as 400 (79 K, 10 GHz) and large-area critical current densities up to (77 K) have been achieved. In order to understand the relationship between the microstructure and electrical properties the films have been characterized by a variety of techniques, but especially transmission electron microsco… Show more

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Cited by 17 publications
(10 citation statements)
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“…The reaction atmosphere is controlled by mixing different flows of oxygen and argon gasses. Preliminary data on the correlation of oxygen partial pressure and temperature [12] on the formation of Tl-Ba-Ca-Cu-O phases clearly indicate that lower oxygen partial pressure requires lower annealing temperatures [13]. The present films were annealed at a temperature of 820 • C for 40 min using an oxygen partial pressure of 0.7 × 10 5 Pa.…”
Section: Film Deposition Structural and Transport Propertiesmentioning
confidence: 78%
“…The reaction atmosphere is controlled by mixing different flows of oxygen and argon gasses. Preliminary data on the correlation of oxygen partial pressure and temperature [12] on the formation of Tl-Ba-Ca-Cu-O phases clearly indicate that lower oxygen partial pressure requires lower annealing temperatures [13]. The present films were annealed at a temperature of 820 • C for 40 min using an oxygen partial pressure of 0.7 × 10 5 Pa.…”
Section: Film Deposition Structural and Transport Propertiesmentioning
confidence: 78%
“…Therefore, the development of low-cost processes represents a crucial step for large-scale applications. To date, efforts to produce single-sided (SS) [9][10][11][12] and double-sided (DS) [13][14][15] thin films of Tl-based superconductors have been largely focused on physical vapor deposition (PVD) techniques.…”
Section: Introductionmentioning
confidence: 99%
“…Plate C is an a-axis needle aligned with c-axis along the axial direction of the cylinder. These needles are also commonly observed in Tl-2212 films grown on planar substrates [22].…”
Section: Tl-2212 Films On Cylindrical Laalo 3 Substratesmentioning
confidence: 70%