The structural and electrical properties of metastable defects in various types of hydrogenated amorphous silicon have been studied using a powerful combination of continuous wave electron-paramagnetic resonance spectroscopy, electron spin echo (ESE) decay measurements, and Doppler broadening positron annihilation spectroscopy. The observed dependence of the paramagnetic defect density on the Doppler S parameter indicates that porous, nanosized void-rich materials exhibit higher spin densities, while dense, divacancy-dominated materials show smaller spin densities. However, after light soaking more similar spin densities are observed, indicating a long-term defect creation process in the Staebler-Wronski effect that does not depend on the a-Si:H nanostructure. From ESE decays it appears that there are fast and slowly relaxing defect types, which are linked to various defect configurations in small and large open volume deficiencies. A nanoscopic model for the creation of light-induced defects in the a-Si:H nanostructure is proposed. The light-induced degradation (LID) of hydrogenated amorphous silicon (a-Si:H), also known as the StaeblerWronski effect (SWE) [1,2], has been extremely thoroughly investigated in the past decades [3][4][5][6][7][8][9][10][11][12][13][14][15][16][17][18][19][20][21]. Although the origin of the SWE and the nature of native and metastable defects is still poorly understood, impressive progress has been made in, for instance, the development of thin-film silicon (TF Si) solar cells. Record initial and stable conversion efficiencies of 16.3%[22] and 13.4%-13.6% [23,24], respectively, have been reported for small area (∼1 cm 2 ) solar cells, all in triple-junction configuration. However, the amorphous junction produces most of the power in such solar cells, which means that fundamentally understanding the SWE is still important when aiming to increase the conversion efficiency of TF Si solar cells. Successfully applied LID-reduction methods include hydrogen (H 2 ) dilution of the silane gas (SiH 4 ) used during the plasma-enhanced chemical vapor deposition (PECVD) [25,26] and the use of a triode PECVD reactor [27,28]. However, the film growth follows such a complex interplay of deposition, etching, and hydrogen (H) effusion that the precise role of H in the a-Si:H nanostructure and the SWE remains obscured, although various growth models have been proposed [29].