The optical properties of monolayer amorphous Al2O3–TiO2 composite films used as HT-APSM blanks for ArF immersion lithography

Mixed metal oxides provide a convenient means to produce coatings with tailored physical properties. We investigate the possibility of synthesizing novel coatings of mixed titanium and aluminum oxide using atomic layer deposition (ALD). Results show that ALD films were prepared with compositions ranging between Al2O3 and TiO2 having refractive indices between 1.6 and 2.4 (at λ = 550 nm) at low temperature. The microstructure and bonding environment within the films was investigated using electron microscopy and x-ray absorption spectroscopy. The films were amorphous, and the Ti and Al atoms were mixed at the atomic scale. The electrical breakdown characteristics of the films were measured and showed that films with intermediate compositions had poor leakage current properties, believed to be caused by the presence of distorted bonding configurations. This study shows that ALD can be used to deposit high quality thin films with tailored optical properties, particularly suitable for applications in which complex topographies are required.

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Immersion Lithography: Photomask and Wafer-Level Materials

French

Tran

2009

Annu. Rev. Mater. Res.

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Optical immersion lithography utilizes liquids with refractive indices >1 (the index of air) below the last lens element to enhance numerical aperture and resolution, enabling sub-40-nm feature patterning. This shift from conventional dry optical lithography introduces numerous challenges requiring innovations in materials at all imaging stack levels. In this article, we highlight the recent materials advances in photomasks, immersion fluids, topcoats, and photoresists. Some of the challenges encountered include the fluids' and photomask materials' UV durability, the high-index liquids' compatibility with topcoats and photoresists, and overall immersion imaging and defectivity performance. In addition, we include a section on novel materials and methods for double-patterning lithography-a technique that may further extend immersion technology by effectively doubling a less dense pattern's line density. 93 Annu. Rev. Mater. Res. 2009.39:93-126. Downloaded from www.annualreviews.org by Otterbein University on 09/17/13. For personal use only.

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The optical properties of monolayer amorphous Al2O3–TiO2 composite films used as HT-APSM blanks for ArF immersion lithography

Cited by 3 publications

References 8 publications

The development of laser-produced plasma EUV light source

The development of laser-produced plasma EUV light source

Engineering titanium and aluminum oxide composites using atomic layer deposition

Immersion Lithography: Photomask and Wafer-Level Materials

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