1999
DOI: 10.1002/(sici)1521-396x(199901)171:1<383::aid-pssa383>3.0.co;2-m
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The Origin and Properties of New Extended Defects Revealed by Etching in Plastically Deformed Si and SiGe

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Cited by 14 publications
(11 citation statements)
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“…1 and 2, respectively. The images show, that the trails consist of rows of extended defects revealed as a short segments [5]. A visible recombination contrast (~3%) associated with dislocation trails is seen in Figs.…”
Section: Methodsmentioning
confidence: 83%
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“…1 and 2, respectively. The images show, that the trails consist of rows of extended defects revealed as a short segments [5]. A visible recombination contrast (~3%) associated with dislocation trails is seen in Figs.…”
Section: Methodsmentioning
confidence: 83%
“…These etchants were found to be effective for different Si crystal surfaces. The main advantage of S and DS solutions is the www.pss-c.com possibility to reveal both dislocation etch pits and other extended defects in the same process [5]. After selective etching the specimens were examined by means of Nomarski differential interference microscopy.…”
Section: Methodsmentioning
confidence: 99%
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