1976
DOI: 10.1149/1.2132972
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The Preparation and Properties of Tin Oxide Films Formed by Oxidation of Tetramethyltin

Abstract: A new technique is described for the deposition of SnO2 films based upon the pyrolysis of tetramethyltin (TMT) in oxygen at relatively low temperatures (~450~ As a tin source, TMT has the advantages of being stable in air and moisture and of being a liquid with a relatively high vapor pressure at room temperature. Thus, a simple bubbler system is used to transport its vapors to the reaction chamber. The deposition technique is characterized by (i) high and controllable growth rates (more than 300 A/min), (it) … Show more

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Cited by 75 publications
(28 citation statements)
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“…My involvement with power semiconductor devices began in 1974 when I was hired by the General Electric Company at their corporate research and development center to start a new group to work on this technology. At that time, I had just completed my Ph.D. degree at Rensselaer Polytechnic Institute by performing research on a novel method for the growth of epitaxial layers of compound semiconductors [1][2][3][4]. Although I wanted to continue to explore this approach after joining the semiconductor industry, I was unable to secure a position at any of the major research laboratories due to a lack of interest in this unproven growth technology.…”
Section: Preface To the First Editionmentioning
confidence: 99%
“…My involvement with power semiconductor devices began in 1974 when I was hired by the General Electric Company at their corporate research and development center to start a new group to work on this technology. At that time, I had just completed my Ph.D. degree at Rensselaer Polytechnic Institute by performing research on a novel method for the growth of epitaxial layers of compound semiconductors [1][2][3][4]. Although I wanted to continue to explore this approach after joining the semiconductor industry, I was unable to secure a position at any of the major research laboratories due to a lack of interest in this unproven growth technology.…”
Section: Preface To the First Editionmentioning
confidence: 99%
“…[1][2][3][4][5][6][7][8][9][10] It has been established that F-doped tin oxide films [1][2][3][4][5][6] have higher conductivity, optical transmission, and infrared reflection than the tin oxide films prepared with other dopants. It is weII known that the conductivity of these films can be enhanced by appropriate doping.…”
Section: Introductionmentioning
confidence: 99%
“…In CVD, hydrolysis of SnC14 is carried out. The oxidation of organometallic tin compounds to obtain SnO2 films has been tried by various workers (Kane et al1975, Baliga andGhandhi 1976). In the evaporation methods either tin is evaporated and later oxidised (Nishino and Hamakawa 1970) or SnOz is evaporated using the electron beam technique (Franz et al 1977).…”
Section: Introductionmentioning
confidence: 99%