2000
DOI: 10.1016/s0013-4686(00)00610-1
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The preparation of flat H–Si(111) surfaces in 40% NH4F revisited

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Cited by 173 publications
(156 citation statements)
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“…capping agents required 51 ); (c) harsh deprotection reactions required; 33,49 (d) non-quantitative coupling yields; 51,127 (e) surface segregation 232 of acid and alkyl chain in mixed decyl/10-carboxydecyl mixed layers; 233 and (f) long term oxidation of the silicon substrate starting from defects sites in the monolayer. 107,117 To address some or all of the above concerns is a precondition if both the structural 78,89,119 and electronic 95 properties of the unoxidized crystalline silicon surface are to be retained upon the formation of an organicpassivated interface, that does not possess significant defect sites, 66,114,117,124,234,235 but rather increases the chemical stability of the interface. 32,115,147,152 3.4 Reactivity of olefin-and acetylene-terminated monolayers It is intuitive that issues on functional group incompatibilities with hydride terminations, as mentioned above, could be easily addressed by employing a symmetrical a,o-bifunctional molecule in the hydrosilylation step.…”
Section: O [Edc]b[nhs]mentioning
confidence: 99%
“…capping agents required 51 ); (c) harsh deprotection reactions required; 33,49 (d) non-quantitative coupling yields; 51,127 (e) surface segregation 232 of acid and alkyl chain in mixed decyl/10-carboxydecyl mixed layers; 233 and (f) long term oxidation of the silicon substrate starting from defects sites in the monolayer. 107,117 To address some or all of the above concerns is a precondition if both the structural 78,89,119 and electronic 95 properties of the unoxidized crystalline silicon surface are to be retained upon the formation of an organicpassivated interface, that does not possess significant defect sites, 66,114,117,124,234,235 but rather increases the chemical stability of the interface. 32,115,147,152 3.4 Reactivity of olefin-and acetylene-terminated monolayers It is intuitive that issues on functional group incompatibilities with hydride terminations, as mentioned above, could be easily addressed by employing a symmetrical a,o-bifunctional molecule in the hydrosilylation step.…”
Section: O [Edc]b[nhs]mentioning
confidence: 99%
“…2c). The triangles of atomically flat Si(111) terraces result from the etching process applying NH 4 F solution containing oxygen [34]. The topography of an initially H-terminated Si(111) surface, was fond to be largely unchanged after subsequent re-oxidation by H 2 SO 4 /H 2 O 2 solution under clean-room conditions and during storage under ambient air conditions for a couple of months.…”
Section: Reduction Of Si Surface Micro-roughness By Wetchemical Oxidamentioning
confidence: 99%
“…In contrast, Si(111) yields atomically flat terraces with monohydride-termination, (See Fig. 2) because during etching in argon-saturated 40% NH 4 F solution the initially rough Si(111) surface will spontaneously smoothen as a result of the differences in reactivities of different crystal faces [Allongue, et al, 2000]. Both hydrogen-terminated Si surfaces are sufficiently stable that they can be handled in air for short periods of time (tens of seconds), allowing wet-chemical modification routes like the formation of organic monolayers.…”
Section: H H H H H Hmentioning
confidence: 99%