The pressure dependence of the deposition rate in a magnetron sputtering system

Sheikin, E. G.

doi:10.1016/j.tsf.2014.11.043

Cited by 18 publications

(1 citation statement)

References 30 publications

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“…At discharge current of 2 A, the deposition rate was 1.5 nm s −1 at pressures of 2 and 12 mTorr. A weak or no dependence of the deposition rate on pressure in this pressure range is often observed in magnetron sputtering under similar conditions [28]. Possible reasons for this may be associated with some pressure-dependent effects that can oppositely affect the deposition rate.…”

Section: Measurement Of Coating Deposition Ratementioning

confidence: 65%

VUV radiation flux from argon DC magnetron plasma

Paĺ

Ryabinkin

Serov

et al. 2020

J. Phys. D: Appl. Phys.

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Vacuum ultraviolet (VUV) flux of argon plasma radiation in a DC magnetron discharge with a plane circular titanium cathode is measured. It is found that the intensity of VUV radiation, mainly indicated by the resonance lines of argon atoms at 104.8 and 106.7 nm and ions at 92 and 93.2 nm, is proportional to the discharge current and decreases with pressure. Following the results of the measurements, a numerical model of resonance radiation transport is developed to determine the VUV flux to the substrate placed near the sputtering cathode where direct measurements are impossible due to the fast contamination of the detector by sputtered atoms. In the case of a substrate located 10 cm opposite the cathode surface, the upper limit of estimated VUV flux is of the order of 1015 photons cm−2 s−1 at a coating deposition rate of 1.5 nm s−1 for 2 and 12 mTorr gas pressures. Based on the measurements, the damage to a porous low-k dielectric by VUV radiation during the deposition of barrier layers in the DC magnetron discharge is first estimated.

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Section: Measurement Of Coating Deposition Ratementioning

confidence: 65%