1984
DOI: 10.1016/0040-6090(84)90448-6
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The process of formation of amorphous Ni-P layers made by electroless deposition

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Cited by 19 publications
(3 citation statements)
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“…There is a possibility that other reflections were present in minor proportions that were not detected because the deposits were too thin. It has been widely observed that fresh bath deposits have either microcrystalline or fine crystalline structures but deviation from crystallinity increase with increase in time and thickness [32]. The sharp diffraction peaks correspond to deposits of crystalline nature while diffuse diffraction peaks reflect amorphous structure.…”
Section: X-ray Diffraction Analysismentioning
confidence: 99%
“…There is a possibility that other reflections were present in minor proportions that were not detected because the deposits were too thin. It has been widely observed that fresh bath deposits have either microcrystalline or fine crystalline structures but deviation from crystallinity increase with increase in time and thickness [32]. The sharp diffraction peaks correspond to deposits of crystalline nature while diffuse diffraction peaks reflect amorphous structure.…”
Section: X-ray Diffraction Analysismentioning
confidence: 99%
“…크롬도금은 외관이 보기 좋고 대기 중에서 변색 이 없으며, 또한 염산 이외의 산에 대해서 부식되 지 않은 성질을 갖고 있으나 전착에 의한 크롬도금 층은 핀홀이나 균열이 생기기 쉽고 소지를 완전히 피복하기가 어려운 것으로 보고되고 있다. 따라서 구리, 니켈 등의 핀홀이 없는 다른 금속을 사용하 고, 그 위에 극히 엷게 전착시키는 것이 일반적인 것으로 알려져 있다 [1][2][3][4][5] . 현재 사용되는 도금액을 표 1에 나타내었는데, 크 롬산 100 g/l의 저농도에서부터 500 g/l의 고농도까 지 사용되고 있다.…”
Section: 서 론unclassified
“…To solve this problem, a coating of a protective layer on the PP substrate was ruminated for avoiding the direct attachment between TiO 2 nanoparticles and the PP substrate. An electroless Ni-P coating on PP has received considerable attention due to its outstanding properties such as excellent corrosion and fouling resistance [18], high hardness and wear resistance [19], as well as low cost and manufacturing ease [20]. The basic component for the electroless bath includes a metal ion source, a reducing agent, complexing agent (s), a bath stabilizer, and a pH-adjusting solution.…”
Section: Introductionmentioning
confidence: 99%