An examination of the efficacy of combining physisorbed and chemisorbed passivation strategies on crystalline Si has been performed. This report compares the influence of a linear alkyl adsorbate tethered by either a Si−C or Si−Si linkage, prepared by reaction of Si(111) with organometallic Grignard reagents or organosilanes, respectively. These modified surfaces are first analyzed and compared by IR and X-ray photoelectron spectroscopies. Their behavior toward a known potent physisorbate, trifluoromethanesulfonic anhydride (Tf 2 O), is then examined. Microwave photoconductivity measurements were obtained which indicate that, while Tf 2 O shows a beneficial lowering of surface recombination on both surface types initially, only surfaces featuring Si−C linkages exhibit long-lasting suppressed surface recombination. The data for Grignard-treated Si after exposure to Tf 2 O in fact represent the longest known report of surface recombination suppression by a physisorbate. Conversely, the data for the Si surfaces prepared by dehydrogenative coupling suggest that these passivating groups themselves introduce defect states that cannot be ameliorated by Tf 2 O physisorption.