The properties of diamond-like carbon films prepared by r.f. discharges

Whang, Ki‐Woong; Tae, Hyunhyuk

doi:10.1016/0040-6090(91)90493-h

Cited by 17 publications

(5 citation statements)

References 11 publications

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“…With increasing deposition pressure, the resistance increases while the hardness first decreases and then slightly rises again. This behavior could be explained with a similar mechanism as described in section ''Influence of bias voltage'' and was already observed by Whang and Tae (1991). With decreasing deposition pressure, the energy of the ions that hit the growing film surface should be increased.…”

Section: Influence Of Deposition Pressuresupporting

confidence: 71%

Development of hydrogenated amorphous carbon thin film with high electrical resistance for use in embedded sensors in abrasive environment

Decho

Stock

Winkelmann

et al. 2012

Journal of Intelligent Material Systems and Structures

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In this study, a hydrogenated amorphous carbon (a-C:H) film with a high electrical resistance is developed for use in embedded sensors in an abrasive environment. The a-C:H and a-C:H:Si films were deposited by magnetron sputtering. Graphite targets were sputtered by means of bipolar pulsed-direct current power supply and addition of acetylene, argon, and krypton. The a-C:H:Si films were deposited using graphite targets with small silicon inserts. To optimize the adhesion, a chromium nitride interlayer was deposited prior to the carbon layer. The influence of bias voltage, acetylene flow, deposition pressure, and silicon doping on the electric resistance was investigated. Hardness, hydrogen content, and bonding status of the coating were also determined. It was found that the resistance of the film increases with decreasing negative bias voltage and increasing acetylene flow and deposition pressure. With increasing resistivity of the film, the hardness decreases. This was attributed to higher hydrogen contents in these films. The silicon doping of the films has no significant effect on the electrical resistance.

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Section: Influence Of Deposition Pressuresupporting

confidence: 71%

Development of hydrogenated amorphous carbon thin film with high electrical resistance for use in embedded sensors in abrasive environment

Decho

Stock

Winkelmann

et al. 2012

Journal of Intelligent Material Systems and Structures

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“…The behavior of electrical, mechanical, and optical properties of DLC films observed by us are well corroborated plasma parameters and with the reported literature. [89][90][91] …”

Section: -11mentioning

confidence: 99%

Investigation of radio frequency plasma for the growth of diamond like carbon films

et al. 2012

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Growth mechanisms of ZnO(0001) investigated using the first-principles calculation J. Appl. Phys. 112, 064301 (2012) Generation of silver-anatase nanocomposite by excimer laser-assisted processing AIP Advances 2, 032171 (2012) Degradation and passivation of CuInSe2The radio frequency has been used to generate plasma of argon, acetylene gases, and their mixture should be replaced by mixture in a plasma enhanced chemical vapor deposition system. The generated plasma discharge has been characterized by an impedance analyzer (VI probe) for the evaluation of various electrical parameters of the plasma discharge such as rf-voltage, rf-current, phase, impedance, and actual power consumed by the plasma discharge. These plasma parameters have been analyzed as a function of self-bias, which are found to depend on applied power, pressure, and reactor geometry of the system. Subsequently, same plasma conditions were used for the deposition of diamond like carbon (DLC) films. The argon plasma has lowest impedance (16.02 X) value and highest average electron density (2.77 Â 10 10 cm À3 ) value at À150 V self-bias. X-ray photoelectron spectroscopy (XPS) and Raman spectroscopy measurements have been performed on the prepared DLC films for the evaluation of the chemical bonding. XPS studies have been used for the evaluation of sp 3 and sp 2 contents. The film deposited at À150 V self-bias has the highest values of sp 3 content (60.97 at. %), band gap, nanohardness, elastic modulus, plastic index parameter, and elastic recovery, and the lowest value of sp 2 content (27.27 at. %) among the films chosen for the present investigation. These DLC films properties were found to be well correlating with the evaluated plasma parameters. V C 2012 American Institute of Physics. [http://dx.

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“…Therefore, a novel thin film deposition method should be developed to improve the electrical conductivity of DLC films while maintaining their corrosion resistance. [1][2][3][4][5][6][7][8][9][10][11][12][13][14][15][16][17] DLC films with high electrical conductivity and corrosion resistance can be used as separators in automotive fuel cells. The separator serves as a channel for supplying the fuel and oxidant to the anode and cathode.…”

Section: Introductionmentioning

confidence: 99%

Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films

Jun

Lee

et al. 2019

J. Korean Ceram. Soc

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Cr-diamond-like carbon (Cr-DLC) films were deposited using a hybrid method involving both physical vapor deposition and plasma-enhanced chemical vapor deposition. DLC sputtering was carried out using argon and acetylene gases. With an increase in the DC power, the Cr content increased from 14.7 to 29.7 at%. The Cr-C bond appeared when the Cr content was 17.6 at% or more. At a Cr content of 17.6 at%, the films showed an electrical conductivity of > 363 S/cm. The current density was 9.12 x 10-2 µA/cm 2 , and the corrosion potential was 0.240 V. Therefore, a Cr content of 17.6 at% was found to be optimum for the deposition of the Cr-DLC thin films. The Cr-DLC thin films developed in this study showed high conductivity and corrosion resistance, and hence, are suitable for applications in separators.

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The properties of diamond-like carbon films prepared by r.f. discharges

Cited by 17 publications

References 11 publications

Development of hydrogenated amorphous carbon thin film with high electrical resistance for use in embedded sensors in abrasive environment

Development of hydrogenated amorphous carbon thin film with high electrical resistance for use in embedded sensors in abrasive environment

Investigation of radio frequency plasma for the growth of diamond like carbon films

Development of Highly Conductive and Corrosion-Resistant Cr-Diamond-like Carbon Films

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