“…Compared with other methods, such as mechanical exfoliation of graphite [12][13][14], liquid-phase exfoliation [15,16], and reduction of graphene oxide (GO) [17,18], chemical vapor deposition (CVD) is regarded as the most promising way for large-scale graphene production at a large scale with low defects, good uniformity, and controlled number of graphene layers, which has attracted intense research attention during the last decades [19][20][21][22]. CVD involves the activation of gaseous reactants and the subsequent chemical reaction, followed by the formation of a stable solid deposit over a suitable substrate such as Ni [6,23], Cu [5,24,25], Fe [26], Pt [27,28], or their alloys [29,30]. As early as 1969, Robertson et al [31] discovered that chemical vapor deposition in the presence of methane produces a layer of graphite on some transition metal surfaces.…”