The role of plasma technology in barrier coating deposition

Liu, Zhongwei; Yang, L.; Sang, Lixia; Wang, Zhengduo; Cheng, Jiushan; Shi, Jianjun; Chen, Qiang

doi:10.1007/s41614-022-00087-z

Cited by 7 publications

(2 citation statements)

References 210 publications

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“…There exists a wide range of approaches to deposit thin barrier films to overcome the high permeation rate of plastics in packing applications. [1][2][3][4][5][6] Dry deposition techniques range from plasma-enhanced chemical vapor deposition (PECVD), or magnetron sputtering to atomic layer deposition (ALD) as well as combinations of them.…”

Section: Applications Relevance Of the Topicmentioning

confidence: 99%

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

de los Arcos,

Awakowicz,

Benedikt

et al. 2023

Plasma Processes & Polymers

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This feature article presents recent results on the analysis of plasma/polymer interactions and the nucleation of ultra‐thin plasma films on polymeric substrates. Because of their high importance for the understanding of such processes, in situ analytical approaches of the plasma volume as well as the plasma/substrate interfaces are introduced before the findings on plasma surface chemistry. The plasma activation of polymeric substrates is divided into the understanding of fundamental processes on model substrates and the relevance of polymer surface complexity. Concerning thin film nucleation and growth, both plasma‐enhanced chemical vapor deposition and plasma‐enhanced atomic layer deposition processes as well as the combination of both processes are considered both for model substrates and technical polymers. Based on the comprehensive presentation of recent results, selective perspectives of this research field are discussed.

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Section: Applications Relevance Of the Topicmentioning

confidence: 99%

PECVD and PEALD on polymer substrates (part I): Fundamentals and analysis of plasma activation and thin film growth

de los Arcos,

Awakowicz,

Benedikt

et al. 2023

Plasma Processes & Polymers

View full text Add to dashboard Cite

show abstract

“…More importantly, cold plasmas are used to treat polymeric surfaces without damaging or degrading bulk polymeric chains, 20,21 thus retaining their bulk macroscopic properties. Typically, a cold plasma 22,23 operates by grafting chemical groups 24,25 and depositing monomers 26,27 on the treated material, thus promoting chemical and physical etching at the nanoscales. A cold oxygen plasma has been employed to treat PTFE, suggesting that the resulting nanostructures were due to etching, 28 while surface modifications of PTFE have been studied using atmospheric pressure plasma-grafted polymerization, 29 and the modified Wilhelmy balance technique.…”

Section: Introductionmentioning

confidence: 99%