Silicon suboxides play an important role in different industrial applications, particularly in the form of the Si-SiO 2 interface, which is one of the key elements in present day microelectronics and potentially in future nano-electronics as well. This paper focuses on the chemical and mechanical effects related to the existence of different oxidation states of Si atoms in SiO x systems with various Si:O composition and topology, such as O atoms in Si, the Si-SiO 2 interface, and O vacancies in SiO 2 . We compare the stress-strain relation in SiO 2 interfaces with (100), (111) and (110) surfaces, the relative stability of oxygen vacancies at different locations in Si-SiO 2 layers and defects in Si and SiO 2 crystals related to O migration. Our study is based on ab initio computations of molecular and periodic systems with both localized and plane wave basis sets.