2000
DOI: 10.1080/00150190008214943
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The synthesis mechanism of complex oxide films formed in dense RF — plasma by reactive sputtering of stoichiometric targets

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Cited by 66 publications
(18 citation statements)
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“…The RF deposition of complex oxide films under a high pressure of working gas ͑oxygen͒ yields films with high crystallinity. 14 The orientation, lattice constants and epitaxial nature of the films were determined by X-ray diffraction ͑XRD͒ ⌰/2⌰ and scans. ⌰-2⌰ XRD a͒ Author to whom correspondence should be addressed; e-mail Elenaគmishina@mail.ru scans revealed only ͑001͒ ͑and traces of ͑100͒ for the thinnest film͒ type reflections and no evidence of second-phase nucleation for all of our films.…”
Section: A Film Fabrication and Structural Characterizationmentioning
confidence: 99%
See 1 more Smart Citation
“…The RF deposition of complex oxide films under a high pressure of working gas ͑oxygen͒ yields films with high crystallinity. 14 The orientation, lattice constants and epitaxial nature of the films were determined by X-ray diffraction ͑XRD͒ ⌰/2⌰ and scans. ⌰-2⌰ XRD a͒ Author to whom correspondence should be addressed; e-mail Elenaគmishina@mail.ru scans revealed only ͑001͒ ͑and traces of ͑100͒ for the thinnest film͒ type reflections and no evidence of second-phase nucleation for all of our films.…”
Section: A Film Fabrication and Structural Characterizationmentioning
confidence: 99%
“…[7][8][9] . Following this, Gopalan et al 10 and Barad et al 11,12 demonstrated the use of polarization diagrams to investigate the domain structures in KnbO 3 and B 14 Ti 3 O 12 .…”
Section: Introductionmentioning
confidence: 99%
“…The layered growth mechanism with an atomically smooth surface was confirmed by the electron microscopy and atomic force microscopy studies of the film surface. This technique of the dep osition of complex oxide films with the perovskite structure was described in more detail in [11][12][13]. During the BST film growth, the substrate tempera ture was maintained equal to 680°C.…”
Section: Sample Preparation and Experimental Techniquementioning
confidence: 99%
“…To process the experimental strains, expression (10) should be averaged as (11) where the notations ν = exp and ξ = are introduced. In expression (11), constants P 0 and P ∞ are unknown.…”
Section: Double Electric Layermentioning
confidence: 99%
“…Пленки сложных оксидов получают методами хими-ческого осаждения металлорганических соединений из газовой фазы (metalorganic chemical vapour depositions, MOCVD) [26,27], импульсного лазерного осаждения (pulsed laser deposition, PLD) [28], высокочастотного магнетронного распыления [29][30][31], гидротермальным методом [32], методами химического осаждения из рас-творов (chemical solution deposition, CSD), включая золь-гель метод [33,34], а также методами молекулярно-лучевой эпитаксии (MBE) [35].…”
Section: Introductionunclassified