The thermal stability of AlN

Abid, A.; Bensalem, R.; Sealy, B.J.

doi:10.1007/bf00553267

Cited by 84 publications

(27 citation statements)

References 2 publications

Supporting

Mentioning

Contrasting

Order By: Relevance

“…In addition, analysis of the O 1s core level peak showed equal contributions from the oxide and hydroxide peaks, i.e., a peak area ratio of 50:50, which corresponds to stoichiometric AlOOH and is consistent with previous reports. 9 The remarkable similarity to the hydrothermal behavior of Al surfaces suggests that the oxidation behavior of AlN is largely determined by Al.…”

Section: Resultsmentioning

confidence: 98%

X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution

Dalmau

Collazo

Mita

et al. 2007

Journal of Elec Materi

View full text Add to dashboard Cite

Oxidized surfaces of aluminum nitride (AlN) epilayers grown on sapphire substrates and of AlN bulk crystals grown by physical vapor transport were studied by x-ray photoelectron spectroscopy (XPS). Analysis of the oxygen core level spectra showed approximately equal contributions from oxygen in two bonding states, which were identified by the binding energies and relative separation of the fitted peaks as OH ) and O 2) . The oxide on air-exposed AlN surfaces was identified as aluminum oxide hydroxide. Systematic annealing experiments were conducted in vacuum to study the thermal evolution of hydroxide layers, and a dehydration mechanism resulting in the formation of Al 2 O 3 at high temperature was identified.

show abstract

Section: Resultsmentioning

confidence: 98%

X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution

Dalmau

Collazo

Mita

et al. 2007

Journal of Elec Materi

View full text Add to dashboard Cite

show abstract

“…Aluminium nitride is also widely studied for other optical applications because of its good thermal stability [3] which is also important as solar cell fabrication process requires high temperature processing.…”

Section: Arcmentioning

confidence: 99%

High bandgap dielectrics for antireflective coating in silicon solar cells by reactive ion sputtering

Kaminski

Bass

Claudio

2011

Phys. Status Solidi (c)

View full text Add to dashboard Cite

High bandgap materials have recently attracted a lot of interest for their potential application in photovoltaics (PV). Aluminium nitride (AlNx) is a potential candidate for the passivation and antireflective coating on silicon solar cells. AlNx thin films have been deposited by a remote plasma deposition system HiTUS (High Target Utilisation Sputtering). The AlNx thin films were grown by reactive sputtering from an aluminium target in a N2 atmosphere, negating the use of silane gas commonly used in PECVD deposition. PC1D simulations have been performed to calculate the best thickness for an antireflective coating for silicon wafers. Several depositions have been performed at different substrate temperatures. Photo conductive measurements by a WCT‐100 were performed on silicon wafer after each thermal process to measure the effective minority carrier lifetime of p‐type crystalline silicon wafer boron doped 〈100〉. Reflectance measurements were performed for samples prepared at different bias and flow gas ratios. Results show that the coating provides reflection reduction to levels below 5% for samples with a thickness of 70 nm. An increase in carrier lifetime has been observed for AlN deposited at high temperature. Annealing at 400 °C has been shown to increase carrier lifetime to 12 µs compared to 7 µs, suggesting the potential of AlN for silicon passivation and an alternative antireflective coating (ARC) to silicon nitride. (© 2011 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)

show abstract

“…The combination of: corrosion resistance of AlN up to 1000°C [26,27], electric conductance and superior physicomechanical properties of both TiB 2 and TiSi 2 makes the high temperature composite ceramic AlN-TiB 2 -TiSi 2 a leading candidate that can meet the requirements for protective coatings for high temperature applications [28][29][30][31]. Bulk ceramics AlN-TiB 2 -TiSi 2 display superior physicomechanical and tribological properties up to 1450°C [32], additionally, Si and B are metalloids which are very effective in stabilizing amorphous phases.…”

Section: Introductionmentioning

confidence: 99%

High temperature behavior of functional TiAlBSiN nanocomposite coatings

Pshyk

Coy

Nowaczyk

et al. 2016

Surface and Coatings Technology

View full text Add to dashboard Cite

This article reports on the thorough characterization of structural-phase transformation in amorphous TiAlBSiN coating after high temperature annealing at 900°C in ambient air. The influence of annealing on the tribomechanical behavior of the coating at nano and micro scale was also examined. The research included multiple experimental techniques, i.e. AFM, SEM, TEM, HR-TEM, EDS, XPS and Raman spectroscopy. Experiments showed that the amorphous phase of the TiAlBSiN coating undergoes a structural transformation, evidenced in the changes of parameters such as topological and chemical short-range order after the post-deposition annealing at 900°C in air. The observed structural transformation, leads to a phase separation with the formation of a three dimensional nc-TiAl 3 /a-SiBN(O) nanocomposite structure. The relative increase of hardness, reduced elastic modulus, H/Er ratio and H 2 /E 3 r ratio after high temperature treatment of TiAlBSiN coatings is also reported. The complex interdependency between chemistry, morphology and relative composition of the amorphous TiAlBSiN coating phase, during the high temperature treatment, with the respective change of the tribo-mechanical characteristics, are evidence of the improvement of the coating properties in response to the environmental conditions and high temperature. This work contributes particularly to the development and understanding of flexible nanocomposite protective coatings and their changes at high temperature of operation.

show abstract

The thermal stability of AlN

Cited by 84 publications

References 2 publications

X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution

X-Ray Photoelectron Spectroscopy Characterization of Aluminum Nitride Surface Oxides: Thermal and Hydrothermal Evolution

High bandgap dielectrics for antireflective coating in silicon solar cells by reactive ion sputtering

High temperature behavior of functional TiAlBSiN nanocomposite coatings

Contact Info

Product

Resources

About