Theoretical analysis of forces in magnetorheological fluid based finishing process

Sidpara, Ajay; Jain, V.K.

doi:10.1016/j.ijmecsci.2012.01.001

Cited by 92 publications

(34 citation statements)

References 17 publications

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“…An experimental based study conducted by Sidpara and Jain [13] on magnetorheological fluid based finishing (MRFF) process revealed that the normal and tangential forces depended primarily on the working gap followed by concentration of CIP and wheel speed. Theoretical models for normal and tangential forces were also predicted by Sidpara and Jain [14] and Alam and Jha [7] for MRFF and BEMRF processes respectively. Singh et al [15] also proposed material removal mechanism and normal force associated with the working gap in BEMRF process.…”

Section: Introductionmentioning

confidence: 86%

Effect of polishing fluid composition on forces in ball end magnetorheological finishing process

Alam

Khan

Iqbal

et al. 2019

IJPTECH

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Ball end magnetorheological finishing (BEMRF) is a nanofinishing process used for fine finishing of flat as well as complex 3D surfaces of a variety of materials. In magnetically energized state, magnetorheological polishing (MRP) fluid containing carbonyl iron particles (CIPs) and polishing grade abrasives is used to remove materials from the workpiece surface. The composition of the MRP fluid greatly influences the forces during the finishing process. Using a dynamometer both normal and shear forces applied by the MRP are recorded on-line. A central composite design of experiments is used to plan the experiments and ANOVA to correlate these forces and process parameters. The process parameters selected here are vol.% of CIPs and vol.% of abrasives which are varied from 5% to 25% and 5% to 20% respectively to measure the forces during experimentation. Both normal and shear forces increase with increase in the CIPs content in the fluid. This is because higher concentration of CIPs increases the magnetic permeability of the MRP fluid making it stiffer when exposed to magnetic field. In case of abrasive concentration it is observed that the forces initially increase with increase in abrasive content but begins to decline after a certain point. The hypothesis behind this is that initially the increased abrasives fill the void between the CIPs chains and strengthens the chain structure of the fluid. However beyond a certain point increased number of abrasives hinders the chain formation leading to the increase in number of broken chains. This decreases the forces during finishing.

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Section: Introductionmentioning

confidence: 86%

Effect of polishing fluid composition on forces in ball end magnetorheological finishing process

Alam

Khan

Iqbal

et al. 2019

IJPTECH

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“…Recent studies [139][140][141][142] reported precisions in the order of nanometers in processing and surface roughnesses in the order of tenths of nanometers. The composite material used was based on an MR suspension along with abrasive microparticles such as silicon carbides, cerium oxide, etc., and the function of the material processed was examined.…”

Section: Ultrafine Polishingmentioning

confidence: 99%

Physical characteristics of magnetorheological suspensions and their applications

Bîcă¹,

Liu²,

Choi³

2013

Journal of Industrial and Engineering Chemistry

174

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“…Sidpara et al proposed a theoretical model of forces acting on the workpiece in MR fluid-based finishing process and carried out an experimental investigation to measure the forces on the freeform surface. The effect of size, concentration and type of abrasive particles as well as the size of magnetic particles on material removal rate and surface roughness of single crystal silicon were also investigated [3][4][5]. Sidpara and Li et al made some nano level finishing for semiconductor materials using magnetorheological finishing process and optimised the values of process parameters [6,7].…”

Section: Introductionmentioning

confidence: 99%

Material removal mechanism of cluster magnetorheological effect in plane polishing

Pan

Yan

2015

Int J Adv Manuf Technol

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A cluster magnetorheological (MR) plane polishing based on a combination of magnetorheological finishing (MRF) and cluster mechanism (arrange in a regular array) has been developed for large planar optical workpiece. In this paper, the polishing pressure of an individual MR micro-grinding head on workpieces was investigated, and the mathematical model for cluster MR plane polishing was established based on the Preston equation and the properties of the workpiece material. An arc-shaped polishing belt was processed on monocrystalline 6H-SiC and Si wafer by the cluster MR polishing apparatus which polishing disk inlaid with cylindrical flat bottom magnetic pole arrange in the same direction regularly and monocyclically. The profile of arc polishing belt's cross section and the surface morphology were observed and analysed to verify the obtained model. The abrasives with different size were found to have an equal effect on the processed surface because of the accommodatedsinking effect of the polishing pad constituted by the cluster MR micro-grinding head. It was found that the monocrystalline 6H-SiC and Si wafer were polished in a plastic mode with a smooth, damage-free surface.

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Theoretical analysis of forces in magnetorheological fluid based finishing process

Cited by 92 publications

References 17 publications

Effect of polishing fluid composition on forces in ball end magnetorheological finishing process

Effect of polishing fluid composition on forces in ball end magnetorheological finishing process

Physical characteristics of magnetorheological suspensions and their applications

Material removal mechanism of cluster magnetorheological effect in plane polishing

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