2014
DOI: 10.1109/tps.2014.2302894
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Theoretical Kinetics Investigation of Xenon Dielectric Barrier Discharge for Excimer Lamp

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Cited by 8 publications
(2 citation statements)
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“…Therefore, α R in this study is ∼ 4.89 × 10 7 m −1 based on α R λ R = 0.137. In plasma discharge devices with Xe discharge gas, the phosphors are excited primarily by VUV lines at 147 and 173 nm [38,39]. The sharp peak at 147 nm results from the transition from the Xe resonance level Xe * (1s 4 ) to the ground state, while the broad peak at 173 nm arises from the excited molecular dimers Xe [41].…”
Section: Re-deposition Of the Sputtered Protective Layer On The Phosphorsmentioning
confidence: 99%
“…Therefore, α R in this study is ∼ 4.89 × 10 7 m −1 based on α R λ R = 0.137. In plasma discharge devices with Xe discharge gas, the phosphors are excited primarily by VUV lines at 147 and 173 nm [38,39]. The sharp peak at 147 nm results from the transition from the Xe resonance level Xe * (1s 4 ) to the ground state, while the broad peak at 173 nm arises from the excited molecular dimers Xe [41].…”
Section: Re-deposition Of the Sputtered Protective Layer On The Phosphorsmentioning
confidence: 99%
“…The UV radiation from the DBD excilamps was studied in the beginning only from the point of view of the physics, and some characteristics, for instance the duration of the UV pulses, were not directly related with the power supply [10]. These discharges were created using generalpurpose linear power amplifiers or pulsed-mode voltage converters [11]- [13].…”
Section: Introductionmentioning
confidence: 99%